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Rahtu, Antti, Ritala, Mikko (2002) Compensation of temperature effects in quartz crystal microbalance measurements. Applied Physics Letters, 80 (3). 521-523 doi:10.1063/1.1433904

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Reference TypeJournal (article/letter/editorial)
TitleCompensation of temperature effects in quartz crystal microbalance measurements
JournalApplied Physics Letters
AuthorsRahtu, AnttiAuthor
Ritala, MikkoAuthor
Year2002 (January 21)Volume80
Issue3
PublisherAIP Publishing
DOIdoi:10.1063/1.1433904Search in ResearchGate
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Mindat Ref. ID8532418Long-form Identifiermindat:1:5:8532418:7
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Full ReferenceRahtu, Antti, Ritala, Mikko (2002) Compensation of temperature effects in quartz crystal microbalance measurements. Applied Physics Letters, 80 (3). 521-523 doi:10.1063/1.1433904
Plain TextRahtu, Antti, Ritala, Mikko (2002) Compensation of temperature effects in quartz crystal microbalance measurements. Applied Physics Letters, 80 (3). 521-523 doi:10.1063/1.1433904
In(2002, January) Applied Physics Letters Vol. 80 (3) AIP Publishing

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Rahtu, Antti, Alaranta, Teemu, Ritala, Mikko (2001) In Situ Quartz Crystal Microbalance and Quadrupole Mass Spectrometry Studies of Atomic Layer Deposition of Aluminum Oxide from Trimethylaluminum and Water. Langmuir, 17. 6506-6509 doi:10.1021/la010103a
Matero, Raija, Rahtu, Antti, Ritala, Mikko (2001) In Situ Quadrupole Mass Spectrometry and Quartz Crystal Microbalance Studies on the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetrachloride and Water. Chemistry of Materials, 13. 4506-4511 doi:10.1021/cm011046+
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Rahtu, Antti, Ritala, Mikko (2002) Reaction Mechanism Studies on the Atomic Layer Deposition of ZrxTiyOzUsing the Novel Metal Halide−Metal Alkoxide Approach. Langmuir, 18. 10046-10048 doi:10.1021/la026357t
Juppo, Marika, Rahtu, Antti, Ritala, Mikko (2002) In Situ Mass Spectrometry Study on Surface Reactions in Atomic Layer Deposition of TiN and Ti(Al)N Thin Films. Chemistry of Materials, 14. 281-287 doi:10.1021/cm011150r
Niskanen, Antti, Rahtu, Antti, Sajavaara, Timo, Arstila, Kai, Ritala, Mikko, Leskelä, Markku (2005) Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films. Journal of the Electrochemical Society, 152. doi:10.1149/1.1824046
Knapas, Kjell, Rahtu, Antti, Ritala, Mikko (2010) Reaction Mechanism Studies on Atomic Layer Deposition of Nb2O5from Nb(OEt)5and Water. Langmuir, 26. 848-853 doi:10.1021/la902289h
Matero, Raija, Rahtu, Antti, Ritala, Mikko (2005) In Situ Reaction Mechanism Studies on the Atomic Layer Deposition of Al2O3from (CH3)2AlCl and Water. Langmuir, 21. 3498-3502 doi:10.1021/la047153a
Rahtu, Antti, Ritala, Mikko, Leskelä, Markku (2001) Atomic Layer Deposition of Zirconium Titanium Oxide from Titanium Isopropoxide and Zirconium Chloride. Chemistry of Materials, 13. 1528-1532 doi:10.1021/cm0012062
Rahtu, Antti, Kukli, Kaupo, Ritala, Mikko (2001) In Situ Mass Spectrometry Study on Atomic Layer Deposition from Metal (Ti, Ta, and Nb) Ethoxides and Water. Chemistry of Materials, 13. 817-823 doi:10.1021/cm0011110
Juppo, Marika, Rahtu, Antti, Ritala, Mikko, Leskelä, Markku (2000) In Situ Mass Spectrometry Study on Surface Reactions in Atomic Layer Deposition of Al2O3Thin Films from Trimethylaluminum and Water. Langmuir, 16. 4034-4039 doi:10.1021/la991183+
 
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