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Bell, M. S., Lacerda, R. G., Teo, K. B. K., Rupesinghe, N. L., Amaratunga, G. A. J., Milne, W. I., Chhowalla, M. (2004) Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes. Applied Physics Letters, 85 (7). 1137-1139 doi:10.1063/1.1782256

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Reference TypeJournal (article/letter/editorial)
TitlePlasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes
JournalApplied Physics Letters
AuthorsBell, M. S.Author
Lacerda, R. G.Author
Teo, K. B. K.Author
Rupesinghe, N. L.Author
Amaratunga, G. A. J.Author
Milne, W. I.Author
Chhowalla, M.Author
Year2004 (August 16)Volume85
Issue7
PublisherAIP Publishing
DOIdoi:10.1063/1.1782256Search in ResearchGate
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Mindat Ref. ID8541607Long-form Identifiermindat:1:5:8541607:1
GUID0
Full ReferenceBell, M. S., Lacerda, R. G., Teo, K. B. K., Rupesinghe, N. L., Amaratunga, G. A. J., Milne, W. I., Chhowalla, M. (2004) Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes. Applied Physics Letters, 85 (7). 1137-1139 doi:10.1063/1.1782256
Plain TextBell, M. S., Lacerda, R. G., Teo, K. B. K., Rupesinghe, N. L., Amaratunga, G. A. J., Milne, W. I., Chhowalla, M. (2004) Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes. Applied Physics Letters, 85 (7). 1137-1139 doi:10.1063/1.1782256
In(2004, August) Applied Physics Letters Vol. 85 (7) AIP Publishing


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