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Li, Guoqiang, Kim, Tae-Won, Inoue, Shigeru, Okamoto, Koichiro, Fujioka, Hiroshi (2006) Epitaxial growth of single-crystalline AlN films on tungsten substrates. Applied Physics Letters, 89 (24). 241905pp. doi:10.1063/1.2404588

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Reference TypeJournal (article/letter/editorial)
TitleEpitaxial growth of single-crystalline AlN films on tungsten substrates
JournalApplied Physics Letters
AuthorsLi, GuoqiangAuthor
Kim, Tae-WonAuthor
Inoue, ShigeruAuthor
Okamoto, KoichiroAuthor
Fujioka, HiroshiAuthor
Year2006 (December 11)Volume89
Issue24
PublisherAIP Publishing
DOIdoi:10.1063/1.2404588Search in ResearchGate
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Mindat Ref. ID8551323Long-form Identifiermindat:1:5:8551323:1
GUID0
Full ReferenceLi, Guoqiang, Kim, Tae-Won, Inoue, Shigeru, Okamoto, Koichiro, Fujioka, Hiroshi (2006) Epitaxial growth of single-crystalline AlN films on tungsten substrates. Applied Physics Letters, 89 (24). 241905pp. doi:10.1063/1.2404588
Plain TextLi, Guoqiang, Kim, Tae-Won, Inoue, Shigeru, Okamoto, Koichiro, Fujioka, Hiroshi (2006) Epitaxial growth of single-crystalline AlN films on tungsten substrates. Applied Physics Letters, 89 (24). 241905pp. doi:10.1063/1.2404588
In(2006, December) Applied Physics Letters Vol. 89 (24) AIP Publishing


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