Cheng, Chao-Ching, Chien, Chao-Hsin, Luo, Guang-Li, Yang, Chun-Hui, Kuo, Mei-Ling, Lin, Je-Hung, Chang, Chun-Yen (2007) Ultrathin Si capping layer suppresses charge trapping in HfOxNy∕Ge metal-insulator-semiconductor capacitors. Applied Physics Letters, 90 (1). 12905pp. doi:10.1063/1.2430629
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Ultrathin Si capping layer suppresses charge trapping in HfOxNy∕Ge metal-insulator-semiconductor capacitors | ||
| Journal | Applied Physics Letters | ||
| Authors | Cheng, Chao-Ching | Author | |
| Chien, Chao-Hsin | Author | ||
| Luo, Guang-Li | Author | ||
| Yang, Chun-Hui | Author | ||
| Kuo, Mei-Ling | Author | ||
| Lin, Je-Hung | Author | ||
| Chang, Chun-Yen | Author | ||
| Year | 2007 (January) | Volume | 90 |
| Issue | 1 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.2430629Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 8552672 | Long-form Identifier | mindat:1:5:8552672:1 |
| GUID | 0 | ||
| Full Reference | Cheng, Chao-Ching, Chien, Chao-Hsin, Luo, Guang-Li, Yang, Chun-Hui, Kuo, Mei-Ling, Lin, Je-Hung, Chang, Chun-Yen (2007) Ultrathin Si capping layer suppresses charge trapping in HfOxNy∕Ge metal-insulator-semiconductor capacitors. Applied Physics Letters, 90 (1). 12905pp. doi:10.1063/1.2430629 | ||
| Plain Text | Cheng, Chao-Ching, Chien, Chao-Hsin, Luo, Guang-Li, Yang, Chun-Hui, Kuo, Mei-Ling, Lin, Je-Hung, Chang, Chun-Yen (2007) Ultrathin Si capping layer suppresses charge trapping in HfOxNy∕Ge metal-insulator-semiconductor capacitors. Applied Physics Letters, 90 (1). 12905pp. doi:10.1063/1.2430629 | ||
| In | (2007, January) Applied Physics Letters Vol. 90 (1) AIP Publishing | ||
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