Reference Type | Journal (article/letter/editorial) |
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Title | Atomistic treatment of interface roughness in Si nanowire transistors with different channel orientations |
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Journal | Applied Physics Letters |
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Authors | Luisier, Mathieu | Author |
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Schenk, Andreas | Author |
Fichtner, Wolfgang | Author |
Year | 2007 (March 5) | Volume | 90 |
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Issue | 10 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.2711275Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 8552719 | Long-form Identifier | mindat:1:5:8552719:1 |
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GUID | 0 |
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Full Reference | Luisier, Mathieu, Schenk, Andreas, Fichtner, Wolfgang (2007) Atomistic treatment of interface roughness in Si nanowire transistors with different channel orientations. Applied Physics Letters, 90 (10). 102103pp. doi:10.1063/1.2711275 |
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Plain Text | Luisier, Mathieu, Schenk, Andreas, Fichtner, Wolfgang (2007) Atomistic treatment of interface roughness in Si nanowire transistors with different channel orientations. Applied Physics Letters, 90 (10). 102103pp. doi:10.1063/1.2711275 |
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In | (2007, March) Applied Physics Letters Vol. 90 (10) AIP Publishing |
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