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Mahieu, S., Depla, D. (2007) Correlation between electron and negative O− ion emission during reactive sputtering of oxides. Applied Physics Letters, 90 (12). 121117pp. doi:10.1063/1.2715113

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Reference TypeJournal (article/letter/editorial)
TitleCorrelation between electron and negative O− ion emission during reactive sputtering of oxides
JournalApplied Physics Letters
AuthorsMahieu, S.Author
Depla, D.Author
Year2007 (March 19)Volume90
Issue12
PublisherAIP Publishing
DOIdoi:10.1063/1.2715113Search in ResearchGate
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Mindat Ref. ID8553005Long-form Identifiermindat:1:5:8553005:2
GUID0
Full ReferenceMahieu, S., Depla, D. (2007) Correlation between electron and negative O− ion emission during reactive sputtering of oxides. Applied Physics Letters, 90 (12). 121117pp. doi:10.1063/1.2715113
Plain TextMahieu, S., Depla, D. (2007) Correlation between electron and negative O− ion emission during reactive sputtering of oxides. Applied Physics Letters, 90 (12). 121117pp. doi:10.1063/1.2715113
In(2007, March) Applied Physics Letters Vol. 90 (12) AIP Publishing

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Depla, D., Heirwegh, S., Mahieu, S., Haemers, J., De Gryse, R. (2007) Understanding the discharge voltage behavior during reactive sputtering of oxides. Journal of Applied Physics, 101 (1). 13301pp. doi:10.1063/1.2404583
Mahieu, S., Leroy, W. P., Van Aeken, K., Depla, D. (2009) Modeling the flux of high energy negative ions during reactive magnetron sputtering. Journal of Applied Physics, 106 (9). 93302pp. doi:10.1063/1.3247545
Mahieu, S., Van Aeken, K., Depla, D. (2008) Quantification of the ion and momentum fluxes toward the substrate during reactive magnetron sputtering. Journal of Applied Physics, 104 (11). 113301pp. doi:10.1063/1.3031527
Mahieu, S., Leroy, W. P., Depla, D., Schreiber, S., Möller, W. (2008) Noble gas retention in the target during rotating cylindrical magnetron sputtering. Applied Physics Letters, 93 (6). 61501pp. doi:10.1063/1.2970037
Depla, D, Heirwegh, S, Mahieu, S, Gryse, R De (2007) Towards a more complete model for reactive magnetron sputtering. Journal of Physics D: Applied Physics, 40. 1957-1965 doi:10.1088/0022-3727/40/7/019
Schelfhout, R., Strijckmans, K., Depla, D. (2016) The existence of a double S-shaped process curve during reactive magnetron sputtering. Applied Physics Letters, 109 (11). 111605pp. doi:10.1063/1.4962958
Mahieu, S., Leroy, W. P., Depla, D., Schreiber, S., Möller, W. (2009) Erratum: “Noble gas retention in the target during rotating cylindrical magnetron sputtering” [Appl. Phys. Lett. 93, 061501 (2008)]. Applied Physics Letters, 94 (6). 69901pp. doi:10.1063/1.3086270
Moens, F, Kalvas, T, Van Steenberge, S, Depla, D (2017) Effect of space charge on the negative oxygen flux during reactive sputtering. Journal of Physics D: Applied Physics, 50. 115201pp. doi:10.1088/1361-6463/aa5ab6
Strijckmans, K., Schelfhout, R., Depla, D. (2018) Tutorial: Hysteresis during the reactive magnetron sputtering process. Journal of Applied Physics, 124 (24). 241101pp. doi:10.1063/1.5042084
Güttler, D., Grötzschel, R., Möller, W. (2007) Lateral variation of target poisoning during reactive magnetron sputtering. Applied Physics Letters, 90 (26). 263502pp. doi:10.1063/1.2752019
Depla, D., Li, X. Y., Mahieu, S., Van Aeken, K., Leroy, W. P., Haemers, J., De Gryse, R., Bogaerts, A. (2010) Rotating cylindrical magnetron sputtering: Simulation of the reactive process. Journal of Applied Physics, 107 (11). 113307pp. doi:10.1063/1.3415550
 
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