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Zhao, Ming, Nakajima, Kaoru, Suzuki, Motofumi, Kimura, Kenji, Uematsu, Masashi, Torii, Kazuyoshi, Kamiyama, Satoshi, Nara, Yasuo, Watanabe, Heiji, Shiraishi, Kenji, Chikyow, Toyohiro, Yamada, Keisaku (2007) Isotopic labeling study of the oxygen diffusion in HfO2∕SiO2∕Si. Applied Physics Letters, 90 (13). 133510pp. doi:10.1063/1.2717539

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Reference TypeJournal (article/letter/editorial)
TitleIsotopic labeling study of the oxygen diffusion in HfO2∕SiO2∕Si
JournalApplied Physics Letters
AuthorsZhao, MingAuthor
Nakajima, KaoruAuthor
Suzuki, MotofumiAuthor
Kimura, KenjiAuthor
Uematsu, MasashiAuthor
Torii, KazuyoshiAuthor
Kamiyama, SatoshiAuthor
Nara, YasuoAuthor
Watanabe, HeijiAuthor
Shiraishi, KenjiAuthor
Chikyow, ToyohiroAuthor
Yamada, KeisakuAuthor
Year2007 (March 26)Volume90
Issue13
PublisherAIP Publishing
DOIdoi:10.1063/1.2717539Search in ResearchGate
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Mindat Ref. ID8553152Long-form Identifiermindat:1:5:8553152:9
GUID0
Full ReferenceZhao, Ming, Nakajima, Kaoru, Suzuki, Motofumi, Kimura, Kenji, Uematsu, Masashi, Torii, Kazuyoshi, Kamiyama, Satoshi, Nara, Yasuo, Watanabe, Heiji, Shiraishi, Kenji, Chikyow, Toyohiro, Yamada, Keisaku (2007) Isotopic labeling study of the oxygen diffusion in HfO2∕SiO2∕Si. Applied Physics Letters, 90 (13). 133510pp. doi:10.1063/1.2717539
Plain TextZhao, Ming, Nakajima, Kaoru, Suzuki, Motofumi, Kimura, Kenji, Uematsu, Masashi, Torii, Kazuyoshi, Kamiyama, Satoshi, Nara, Yasuo, Watanabe, Heiji, Shiraishi, Kenji, Chikyow, Toyohiro, Yamada, Keisaku (2007) Isotopic labeling study of the oxygen diffusion in HfO2∕SiO2∕Si. Applied Physics Letters, 90 (13). 133510pp. doi:10.1063/1.2717539
In(2007, March) Applied Physics Letters Vol. 90 (13) AIP Publishing

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