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Cheng, Yang-Chun, Isoyan, Artak, Wallace, John, Khan, Mumit, Cerrina, Franco (2007) Extreme ultraviolet holographic lithography: Initial results. Applied Physics Letters, 90 (2). 23116pp. doi:10.1063/1.2430774

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Reference TypeJournal (article/letter/editorial)
TitleExtreme ultraviolet holographic lithography: Initial results
JournalApplied Physics Letters
AuthorsCheng, Yang-ChunAuthor
Isoyan, ArtakAuthor
Wallace, JohnAuthor
Khan, MumitAuthor
Cerrina, FrancoAuthor
Year2007 (January 8)Volume90
Issue2
PublisherAIP Publishing
DOIdoi:10.1063/1.2430774Search in ResearchGate
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Mindat Ref. ID8554036Long-form Identifiermindat:1:5:8554036:9
GUID0
Full ReferenceCheng, Yang-Chun, Isoyan, Artak, Wallace, John, Khan, Mumit, Cerrina, Franco (2007) Extreme ultraviolet holographic lithography: Initial results. Applied Physics Letters, 90 (2). 23116pp. doi:10.1063/1.2430774
Plain TextCheng, Yang-Chun, Isoyan, Artak, Wallace, John, Khan, Mumit, Cerrina, Franco (2007) Extreme ultraviolet holographic lithography: Initial results. Applied Physics Letters, 90 (2). 23116pp. doi:10.1063/1.2430774
In(2007, January) Applied Physics Letters Vol. 90 (2) AIP Publishing

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Wallace, John, Cheng, Yang-Chun, Isoyan, Artak, Leonard, Quinn, Fisher, Mike, Green, Mike, Bisognano, Joseph, Nealey, Paul, Cerrina, Franco (2007) A novel EUV exposure station for nanotechnology studies. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 582 (1). 254-257 doi:10.1016/j.nima.2007.08.124
Wu, Banqiu, Kumar, Ajay (2007) Plasma etch method for extreme ultraviolet lithography photomask. Applied Physics Letters, 90 (6). 63105pp. doi:10.1063/1.2470470
Solak, H. H., He, D., Li, W., Singh-Gasson, S., Cerrina, F., Sohn, B. H., Yang, X. M., Nealey, P. (1999) Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography. Applied Physics Letters, 75 (15). 2328-2330 doi:10.1063/1.125005
Malueg, Daniel H., Khan, Mumit, Cerrina, Franco, Taylor, James W. (2004) Modeling Clear Phase-Mask Materials for Sub-50 nm X-Ray Application. Japanese Journal of Applied Physics, 43 (6) 3722-3727 doi:10.1143/jjap.43.3722
Chen, Gong, Wallace, John P., Cerrina, Franco (1993) Linear-Fresnel-Zone-Plate-Based Two-State Alignment Method for Sub-0.25 µm X-Ray Lithography System. Japanese Journal of Applied Physics, 32. 5977-5981 doi:10.1143/jjap.32.5977
Zhou, Guangya, Chau, Fook Siong (2007) Three-dimensional photonic crystal by holographic contact lithography using a single diffraction mask. Applied Physics Letters, 90 (18). 181106pp. doi:10.1063/1.2734473
Alianelli, Lucia, Sanchez del Rio, Manuel, Khan, Mumit, Cerrina, Franco (2003) A comment on `A new ray-tracing programRIGTRACEfor X-ray optical systems' [J. Synchrotron Rad.(2001),8, 1047–1050]. Journal of Synchrotron Radiation, 10 (2). 191-192 doi:10.1107/s090904950202352x
Goldstein, M., Wüest, A., Barnhart, D. (2008) Partially coherent extreme ultraviolet interference lithography for 16nm patterning research. Applied Physics Letters, 93 (8). 83110pp. doi:10.1063/1.2973178
Wu, Banqiu, Kumar, Ajay (2007) Mask haze formation in deep ultraviolet lithography. Applied Physics Letters, 91 (16). 163110pp. doi:10.1063/1.2799866
Sugawara, Minoru, Nishiyama, Iwao (2007) Impact of Slanted Absorber Side Walls on Critical Dimension Error in Extreme Ultraviolet Lithography. Japanese Journal of Applied Physics, 46 (1) 84-90 doi:10.1143/jjap.46.84
Wurm, Stefan (2007) Extreme Ultraviolet Lithography Development in the United States. Japanese Journal of Applied Physics, 46 (9) 6105-6112 doi:10.1143/jjap.46.6105
 
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