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Chang, W. J., Hsieh, C. C., Chung, T. Y., Hsu, S. Y., Wu, K. H., Uen, T. M., Lin, J.-Y., Lin, J. J., Hsu, C.-H., Kuo, Y. K., Liu, H. L., Hsu, M. H., Gou, Y. S., Juang, J. Y. (2007) Fabrication and low temperature thermoelectric properties of NaxCoO2 (x=0.68 and 0.75) epitaxial films by the reactive solid-phase epitaxy. Applied Physics Letters, 90 (6). 61917pp. doi:10.1063/1.2437131

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Reference TypeJournal (article/letter/editorial)
TitleFabrication and low temperature thermoelectric properties of NaxCoO2 (x=0.68 and 0.75) epitaxial films by the reactive solid-phase epitaxy
JournalApplied Physics Letters
AuthorsChang, W. J.Author
Hsieh, C. C.Author
Chung, T. Y.Author
Hsu, S. Y.Author
Wu, K. H.Author
Uen, T. M.Author
Lin, J.-Y.Author
Lin, J. J.Author
Hsu, C.-H.Author
Kuo, Y. K.Author
Liu, H. L.Author
Hsu, M. H.Author
Gou, Y. S.Author
Juang, J. Y.Author
Year2007 (February 5)Volume90
Issue6
PublisherAIP Publishing
DOIdoi:10.1063/1.2437131Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8555230Long-form Identifiermindat:1:5:8555230:0
GUID0
Full ReferenceChang, W. J., Hsieh, C. C., Chung, T. Y., Hsu, S. Y., Wu, K. H., Uen, T. M., Lin, J.-Y., Lin, J. J., Hsu, C.-H., Kuo, Y. K., Liu, H. L., Hsu, M. H., Gou, Y. S., Juang, J. Y. (2007) Fabrication and low temperature thermoelectric properties of NaxCoO2 (x=0.68 and 0.75) epitaxial films by the reactive solid-phase epitaxy. Applied Physics Letters, 90 (6). 61917pp. doi:10.1063/1.2437131
Plain TextChang, W. J., Hsieh, C. C., Chung, T. Y., Hsu, S. Y., Wu, K. H., Uen, T. M., Lin, J.-Y., Lin, J. J., Hsu, C.-H., Kuo, Y. K., Liu, H. L., Hsu, M. H., Gou, Y. S., Juang, J. Y. (2007) Fabrication and low temperature thermoelectric properties of NaxCoO2 (x=0.68 and 0.75) epitaxial films by the reactive solid-phase epitaxy. Applied Physics Letters, 90 (6). 61917pp. doi:10.1063/1.2437131
In(2007, February) Applied Physics Letters Vol. 90 (6) AIP Publishing

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