Ofan, Avishai, Gaathon, Ophir, Vanamurthy, Lakshmanan, Bakhru, Sasha, Bakhru, Hassaram, Evans-Lutterodt, Kenneth, Osgood, Richard M. (2008) Origin of highly spatially selective etching in deeply implanted complex oxides. Applied Physics Letters, 93 (18). 181906pp. doi:10.1063/1.3013821
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Origin of highly spatially selective etching in deeply implanted complex oxides | ||
Journal | Applied Physics Letters | ||
Authors | Ofan, Avishai | Author | |
Gaathon, Ophir | Author | ||
Vanamurthy, Lakshmanan | Author | ||
Bakhru, Sasha | Author | ||
Bakhru, Hassaram | Author | ||
Evans-Lutterodt, Kenneth | Author | ||
Osgood, Richard M. | Author | ||
Year | 2008 (November 3) | Volume | 93 |
Issue | 18 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.3013821Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8568654 | Long-form Identifier | mindat:1:5:8568654:6 |
GUID | 0 | ||
Full Reference | Ofan, Avishai, Gaathon, Ophir, Vanamurthy, Lakshmanan, Bakhru, Sasha, Bakhru, Hassaram, Evans-Lutterodt, Kenneth, Osgood, Richard M. (2008) Origin of highly spatially selective etching in deeply implanted complex oxides. Applied Physics Letters, 93 (18). 181906pp. doi:10.1063/1.3013821 | ||
Plain Text | Ofan, Avishai, Gaathon, Ophir, Vanamurthy, Lakshmanan, Bakhru, Sasha, Bakhru, Hassaram, Evans-Lutterodt, Kenneth, Osgood, Richard M. (2008) Origin of highly spatially selective etching in deeply implanted complex oxides. Applied Physics Letters, 93 (18). 181906pp. doi:10.1063/1.3013821 | ||
In | (2008, November) Applied Physics Letters Vol. 93 (18) AIP Publishing |
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