Arnoult, G., Belmonte, T., Henrion, G. (2010) Self-organization of SiO2 nanodots deposited by chemical vapor deposition using an atmospheric pressure remote microplasma. Applied Physics Letters, 96 (10). 101505pp. doi:10.1063/1.3360228
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Self-organization of SiO2 nanodots deposited by chemical vapor deposition using an atmospheric pressure remote microplasma | ||
Journal | Applied Physics Letters | ||
Authors | Arnoult, G. | Author | |
Belmonte, T. | Author | ||
Henrion, G. | Author | ||
Year | 2010 (March 8) | Volume | 96 |
Issue | 10 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.3360228Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8581979 | Long-form Identifier | mindat:1:5:8581979:1 |
GUID | 0 | ||
Full Reference | Arnoult, G., Belmonte, T., Henrion, G. (2010) Self-organization of SiO2 nanodots deposited by chemical vapor deposition using an atmospheric pressure remote microplasma. Applied Physics Letters, 96 (10). 101505pp. doi:10.1063/1.3360228 | ||
Plain Text | Arnoult, G., Belmonte, T., Henrion, G. (2010) Self-organization of SiO2 nanodots deposited by chemical vapor deposition using an atmospheric pressure remote microplasma. Applied Physics Letters, 96 (10). 101505pp. doi:10.1063/1.3360228 | ||
In | (2010, March) Applied Physics Letters Vol. 96 (10) AIP Publishing |
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