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Claassen, J. H., Lu, J. W., West, K. G., Wolf, S. A. (2010) Relaxation dynamics of the metal-semiconductor transition in VO2 thin films. Applied Physics Letters, 96 (13). 132102pp. doi:10.1063/1.3370353

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Reference TypeJournal (article/letter/editorial)
TitleRelaxation dynamics of the metal-semiconductor transition in VO2 thin films
JournalApplied Physics Letters
AuthorsClaassen, J. H.Author
Lu, J. W.Author
West, K. G.Author
Wolf, S. A.Author
Year2010 (March 29)Volume96
Issue13
PublisherAIP Publishing
DOIdoi:10.1063/1.3370353Search in ResearchGate
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Mindat Ref. ID8582357Long-form Identifiermindat:1:5:8582357:2
GUID0
Full ReferenceClaassen, J. H., Lu, J. W., West, K. G., Wolf, S. A. (2010) Relaxation dynamics of the metal-semiconductor transition in VO2 thin films. Applied Physics Letters, 96 (13). 132102pp. doi:10.1063/1.3370353
Plain TextClaassen, J. H., Lu, J. W., West, K. G., Wolf, S. A. (2010) Relaxation dynamics of the metal-semiconductor transition in VO2 thin films. Applied Physics Letters, 96 (13). 132102pp. doi:10.1063/1.3370353
In(2010, March) Applied Physics Letters Vol. 96 (13) AIP Publishing

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