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Zhang, Q., Wang, X. Q., Yin, C. M., Xu, F. J., Tang, N., Shen, B., Chen, Y. H., Chang, K., Ge, W. K., Ishitani, Y., Yoshikawa, A. (2010) Strong circular photogalvanic effect in ZnO epitaxial films. Applied Physics Letters, 97 (4). 41907pp. doi:10.1063/1.3467835

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Reference TypeJournal (article/letter/editorial)
TitleStrong circular photogalvanic effect in ZnO epitaxial films
JournalApplied Physics Letters
AuthorsZhang, Q.Author
Wang, X. Q.Author
Yin, C. M.Author
Xu, F. J.Author
Tang, N.Author
Shen, B.Author
Chen, Y. H.Author
Chang, K.Author
Ge, W. K.Author
Ishitani, Y.Author
Yoshikawa, A.Author
Year2010 (July 26)Volume97
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.3467835Search in ResearchGate
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Mindat Ref. ID8589816Long-form Identifiermindat:1:5:8589816:9
GUID0
Full ReferenceZhang, Q., Wang, X. Q., Yin, C. M., Xu, F. J., Tang, N., Shen, B., Chen, Y. H., Chang, K., Ge, W. K., Ishitani, Y., Yoshikawa, A. (2010) Strong circular photogalvanic effect in ZnO epitaxial films. Applied Physics Letters, 97 (4). 41907pp. doi:10.1063/1.3467835
Plain TextZhang, Q., Wang, X. Q., Yin, C. M., Xu, F. J., Tang, N., Shen, B., Chen, Y. H., Chang, K., Ge, W. K., Ishitani, Y., Yoshikawa, A. (2010) Strong circular photogalvanic effect in ZnO epitaxial films. Applied Physics Letters, 97 (4). 41907pp. doi:10.1063/1.3467835
In(2010, July) Applied Physics Letters Vol. 97 (4) AIP Publishing

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