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Bedair, Sarah S., Judy, Daniel, Pulskamp, Jeffrey, Polcawich, Ronald G., Gillon, Adam, Hwang, Eugene, Bhave, Sunil (2011) High rejection, tunable parallel resonance in micromachined lead zirconate titanate on silicon resonators. Applied Physics Letters, 99 (10). 103509pp. doi:10.1063/1.3636432

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Reference TypeJournal (article/letter/editorial)
TitleHigh rejection, tunable parallel resonance in micromachined lead zirconate titanate on silicon resonators
JournalApplied Physics Letters
AuthorsBedair, Sarah S.Author
Judy, DanielAuthor
Pulskamp, JeffreyAuthor
Polcawich, Ronald G.Author
Gillon, AdamAuthor
Hwang, EugeneAuthor
Bhave, SunilAuthor
Year2011 (September 5)Volume99
Issue10
PublisherAIP Publishing
DOIdoi:10.1063/1.3636432Search in ResearchGate
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Mindat Ref. ID8595713Long-form Identifiermindat:1:5:8595713:4
GUID0
Full ReferenceBedair, Sarah S., Judy, Daniel, Pulskamp, Jeffrey, Polcawich, Ronald G., Gillon, Adam, Hwang, Eugene, Bhave, Sunil (2011) High rejection, tunable parallel resonance in micromachined lead zirconate titanate on silicon resonators. Applied Physics Letters, 99 (10). 103509pp. doi:10.1063/1.3636432
Plain TextBedair, Sarah S., Judy, Daniel, Pulskamp, Jeffrey, Polcawich, Ronald G., Gillon, Adam, Hwang, Eugene, Bhave, Sunil (2011) High rejection, tunable parallel resonance in micromachined lead zirconate titanate on silicon resonators. Applied Physics Letters, 99 (10). 103509pp. doi:10.1063/1.3636432
In(2011, September) Applied Physics Letters Vol. 99 (10) AIP Publishing

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