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Wimmer, M., Bär, M., Gerlach, D., Wilks, R. G., Scherf, S., Lupulescu, C., Ruske, F., Félix, R., Hüpkes, J., Gavrila, G., Gorgoi, M., Lips, K., Eberhardt, W., Rech, B. (2011) Hard x-ray photoelectron spectroscopy study of the buried Si/ZnO thin-film solar cell interface: Direct evidence for the formation of Si–O at the expense of Zn-O bonds. Applied Physics Letters, 99 (15). 152104pp. doi:10.1063/1.3644084

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Reference TypeJournal (article/letter/editorial)
TitleHard x-ray photoelectron spectroscopy study of the buried Si/ZnO thin-film solar cell interface: Direct evidence for the formation of Si–O at the expense of Zn-O bonds
JournalApplied Physics Letters
AuthorsWimmer, M.Author
Bär, M.Author
Gerlach, D.Author
Wilks, R. G.Author
Scherf, S.Author
Lupulescu, C.Author
Ruske, F.Author
Félix, R.Author
Hüpkes, J.Author
Gavrila, G.Author
Gorgoi, M.Author
Lips, K.Author
Eberhardt, W.Author
Rech, B.Author
Year2011 (October 10)Volume99
Issue15
PublisherAIP Publishing
DOIdoi:10.1063/1.3644084Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8596513Long-form Identifiermindat:1:5:8596513:3
GUID0
Full ReferenceWimmer, M., Bär, M., Gerlach, D., Wilks, R. G., Scherf, S., Lupulescu, C., Ruske, F., Félix, R., Hüpkes, J., Gavrila, G., Gorgoi, M., Lips, K., Eberhardt, W., Rech, B. (2011) Hard x-ray photoelectron spectroscopy study of the buried Si/ZnO thin-film solar cell interface: Direct evidence for the formation of Si–O at the expense of Zn-O bonds. Applied Physics Letters, 99 (15). 152104pp. doi:10.1063/1.3644084
Plain TextWimmer, M., Bär, M., Gerlach, D., Wilks, R. G., Scherf, S., Lupulescu, C., Ruske, F., Félix, R., Hüpkes, J., Gavrila, G., Gorgoi, M., Lips, K., Eberhardt, W., Rech, B. (2011) Hard x-ray photoelectron spectroscopy study of the buried Si/ZnO thin-film solar cell interface: Direct evidence for the formation of Si–O at the expense of Zn-O bonds. Applied Physics Letters, 99 (15). 152104pp. doi:10.1063/1.3644084
In(2011, October) Applied Physics Letters Vol. 99 (15) AIP Publishing

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