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Chen, C. Z., Ma, D. L., Huang, N., Leng, Y. X. (2019) Influence of peak current on substrate plasma sheath properties of Ti films deposited by high-power pulsed magnetron sputtering. International Journal of Modern Physics B, 33 (1). 1940016pp. doi:10.1142/s0217979219400162

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Reference TypeJournal (article/letter/editorial)
TitleInfluence of peak current on substrate plasma sheath properties of Ti films deposited by high-power pulsed magnetron sputtering
JournalInternational Journal of Modern Physics B
AuthorsChen, C. Z.Author
Ma, D. L.Author
Huang, N.Author
Leng, Y. X.Author
Year2019 (January 30)Volume33
Issue1
PublisherWorld Scientific Pub Co Pte Lt
DOIdoi:10.1142/s0217979219400162Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8912876Long-form Identifiermindat:1:5:8912876:7
GUID0
Full ReferenceChen, C. Z., Ma, D. L., Huang, N., Leng, Y. X. (2019) Influence of peak current on substrate plasma sheath properties of Ti films deposited by high-power pulsed magnetron sputtering. International Journal of Modern Physics B, 33 (1). 1940016pp. doi:10.1142/s0217979219400162
Plain TextChen, C. Z., Ma, D. L., Huang, N., Leng, Y. X. (2019) Influence of peak current on substrate plasma sheath properties of Ti films deposited by high-power pulsed magnetron sputtering. International Journal of Modern Physics B, 33 (1). 1940016pp. doi:10.1142/s0217979219400162
In(2019, January) International Journal of Modern Physics B Vol. 33 (1) World Scientific Pub Co Pte Lt

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