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Edwards, Erik W., Stoykovich, Mark P., Müller, Marcus, Solak, Harun H., de Pablo, Juan J., Nealey, Paul F. (2005) Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates. Journal of Polymer Science Part B: Polymer Physics, 43 (23). 3444-3459 doi:10.1002/polb.20643

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Reference TypeJournal (article/letter/editorial)
TitleMechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates
JournalJournal of Polymer Science Part B: Polymer Physics
AuthorsEdwards, Erik W.Author
Stoykovich, Mark P.Author
Müller, MarcusAuthor
Solak, Harun H.Author
de Pablo, Juan J.Author
Nealey, Paul F.Author
Year2005 (December 1)Volume43
Issue23
PublisherWiley
DOIdoi:10.1002/polb.20643Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8965202Long-form Identifiermindat:1:5:8965202:4
GUID0
Full ReferenceEdwards, Erik W., Stoykovich, Mark P., Müller, Marcus, Solak, Harun H., de Pablo, Juan J., Nealey, Paul F. (2005) Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates. Journal of Polymer Science Part B: Polymer Physics, 43 (23). 3444-3459 doi:10.1002/polb.20643
Plain TextEdwards, Erik W., Stoykovich, Mark P., Müller, Marcus, Solak, Harun H., de Pablo, Juan J., Nealey, Paul F. (2005) Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates. Journal of Polymer Science Part B: Polymer Physics, 43 (23). 3444-3459 doi:10.1002/polb.20643
In(2005, December) Journal of Polymer Science Part B: Polymer Physics Vol. 43 (23) Wiley


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