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He, Huan, Zhou, Peiran, Shimabuku, Kyle K., Fang, Xuzhi, Li, Shu, Lee, Yunho, Dodd, Michael C. (2019) Degradation and Deactivation of Bacterial Antibiotic Resistance Genes during Exposure to Free Chlorine, Monochloramine, Chlorine Dioxide, Ozone, Ultraviolet Light, and Hydroxyl Radical. Environmental Science & Technology, 53 (4). 2013-2026 doi:10.1021/acs.est.8b04393

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Reference TypeJournal (article/letter/editorial)
TitleDegradation and Deactivation of Bacterial Antibiotic Resistance Genes during Exposure to Free Chlorine, Monochloramine, Chlorine Dioxide, Ozone, Ultraviolet Light, and Hydroxyl Radical
JournalEnvironmental Science & Technology
AuthorsHe, HuanAuthor
Zhou, PeiranAuthor
Shimabuku, Kyle K.Author
Fang, XuzhiAuthor
Li, ShuAuthor
Lee, YunhoAuthor
Dodd, Michael C.Author
Year2019 (February 19)Volume53
Issue4
PublisherAmerican Chemical Society (ACS)
DOIdoi:10.1021/acs.est.8b04393Search in ResearchGate
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Mindat Ref. ID9421971Long-form Identifiermindat:1:5:9421971:7
GUID0
Full ReferenceHe, Huan, Zhou, Peiran, Shimabuku, Kyle K., Fang, Xuzhi, Li, Shu, Lee, Yunho, Dodd, Michael C. (2019) Degradation and Deactivation of Bacterial Antibiotic Resistance Genes during Exposure to Free Chlorine, Monochloramine, Chlorine Dioxide, Ozone, Ultraviolet Light, and Hydroxyl Radical. Environmental Science & Technology, 53 (4). 2013-2026 doi:10.1021/acs.est.8b04393
Plain TextHe, Huan, Zhou, Peiran, Shimabuku, Kyle K., Fang, Xuzhi, Li, Shu, Lee, Yunho, Dodd, Michael C. (2019) Degradation and Deactivation of Bacterial Antibiotic Resistance Genes during Exposure to Free Chlorine, Monochloramine, Chlorine Dioxide, Ozone, Ultraviolet Light, and Hydroxyl Radical. Environmental Science & Technology, 53 (4). 2013-2026 doi:10.1021/acs.est.8b04393
In(2019, February) Environmental Science & Technology Vol. 53 (4) American Chemical Society (ACS)

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He, Huan, Zhou, Peiran, Shimabuku, Kyle K., Fang, Xuzhi, Li, Shu, Lee, Yunho, Dodd, Michael C. (2020) Correction to Degradation and Deactivation of Bacterial Antibiotic Resistance Genes during Exposure to Free Chlorine, Monochloramine, Chlorine Dioxide, Ozone, Ultraviolet Light, and Hydroxyl Radical. Environmental Science & Technology, 54 (17) 10975 doi:10.1021/acs.est.0c04935
He, Huan; Liou, Sin-Yi; Shimabuku, Kyle K.; Zhou, Peiran; Choi, Yegyun; Meschke, John S.; Roberts, Marilyn C.; Lee, Yunho; Dodd, Michael C. (2025) Degradation and Deactivation of Intracellular Bacterial Antibiotic Resistance Genes by Commonly Used Healthcare and Personal Care Disinfectants. Environmental Science & Technology, 59 (17). doi:10.1021/acs.est.4c10223
Yoon, Younggun, He, Huan, Dodd, Michael C., Lee, Yunho (2021) Degradation and deactivation of plasmid-encoded antibiotic resistance genes during exposure to ozone and chlorine. Water Research, 202. 117408pp. doi:10.1016/j.watres.2021.117408
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Nihemaiti, Maolida, Yoon, Younggun, He, Huan, Dodd, Michael C., Croué, Jean-Philippe, Lee, Yunho (2020) Degradation and deactivation of a plasmid-encoded extracellular antibiotic resistance gene during separate and combined exposures to UV254 and radicals. Water Research, 182. 115921pp. doi:10.1016/j.watres.2020.115921
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Liu, Hong, Wahman, David G., Pressman, Jonathan G. (2019) Evaluation of Monochloramine and Free Chlorine Penetration in a Drinking Water Storage Tank Sediment Using Microelectrodes. Environmental Science & Technology, 53 (16). 9352-9360 doi:10.1021/acs.est.9b01189
 
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