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Muthumali DeSilva, Kokge Thilini Kanchana, Rajagopalan, Uma Maheswari, Kadono, Hirofumi (2017) Highly sensitive optical interferometric technique reveals stress-dependent instantaneous nanometric growth fluctuations of Chinese chive leaf under heavy metal stress. Ecotoxicology and Environmental Safety, 137. 86-93 doi:10.1016/j.ecoenv.2016.11.020

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Reference TypeJournal (article/letter/editorial)
TitleHighly sensitive optical interferometric technique reveals stress-dependent instantaneous nanometric growth fluctuations of Chinese chive leaf under heavy metal stress
JournalEcotoxicology and Environmental Safety
AuthorsMuthumali DeSilva, Kokge Thilini KanchanaAuthor
Rajagopalan, Uma MaheswariAuthor
Kadono, HirofumiAuthor
Year2017 (March)Volume137
PublisherElsevier BV
DOIdoi:10.1016/j.ecoenv.2016.11.020Search in ResearchGate
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Mindat Ref. ID9653524Long-form Identifiermindat:1:5:9653524:8
GUID0
Full ReferenceMuthumali DeSilva, Kokge Thilini Kanchana, Rajagopalan, Uma Maheswari, Kadono, Hirofumi (2017) Highly sensitive optical interferometric technique reveals stress-dependent instantaneous nanometric growth fluctuations of Chinese chive leaf under heavy metal stress. Ecotoxicology and Environmental Safety, 137. 86-93 doi:10.1016/j.ecoenv.2016.11.020
Plain TextMuthumali DeSilva, Kokge Thilini Kanchana, Rajagopalan, Uma Maheswari, Kadono, Hirofumi (2017) Highly sensitive optical interferometric technique reveals stress-dependent instantaneous nanometric growth fluctuations of Chinese chive leaf under heavy metal stress. Ecotoxicology and Environmental Safety, 137. 86-93 doi:10.1016/j.ecoenv.2016.11.020
In(n.d.) Ecotoxicology and Environmental Safety Vol. 137. Elsevier BV

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