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Liao, W. T., Lee, W. J., Chen, C. Y., Shih, M. (2001) Decomposition of Ethylene Oxide in the RF Plasma Environment. Environmental Technology, 22 (2). 165-173 doi:10.1080/09593332208618293

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Reference TypeJournal (article/letter/editorial)
TitleDecomposition of Ethylene Oxide in the RF Plasma Environment
JournalEnvironmental Technology
AuthorsLiao, W. T.Author
Lee, W. J.Author
Chen, C. Y.Author
Shih, M.Author
Year2001 (February)Volume22
Issue2
PublisherInforma UK Limited
DOIdoi:10.1080/09593332208618293Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID9668437Long-form Identifiermindat:1:5:9668437:7
GUID0
Full ReferenceLiao, W. T., Lee, W. J., Chen, C. Y., Shih, M. (2001) Decomposition of Ethylene Oxide in the RF Plasma Environment. Environmental Technology, 22 (2). 165-173 doi:10.1080/09593332208618293
Plain TextLiao, W. T., Lee, W. J., Chen, C. Y., Shih, M. (2001) Decomposition of Ethylene Oxide in the RF Plasma Environment. Environmental Technology, 22 (2). 165-173 doi:10.1080/09593332208618293
In(2001, February) Environmental Technology Vol. 22 (2) Informa UK Limited

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