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Lawes, Ronald A. (1989) Sub-micron lithography techniques. Applied Surface Science, 36. 485-499 doi:10.1016/0169-4332(89)90943-4

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Reference TypeJournal (article/letter/editorial)
TitleSub-micron lithography techniques
JournalApplied Surface Science
AuthorsLawes, Ronald A.Author
Year1989 (January)Volume36
PublisherElsevier BV
DOIdoi:10.1016/0169-4332(89)90943-4Search in ResearchGate
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Mindat Ref. ID9894633Long-form Identifiermindat:1:5:9894633:2
GUID0
Full ReferenceLawes, Ronald A. (1989) Sub-micron lithography techniques. Applied Surface Science, 36. 485-499 doi:10.1016/0169-4332(89)90943-4
Plain TextLawes, Ronald A. (1989) Sub-micron lithography techniques. Applied Surface Science, 36. 485-499 doi:10.1016/0169-4332(89)90943-4
In(n.d.) Applied Surface Science Vol. 36. Elsevier BV

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(1989) Preface. Applied Surface Science, 36. doi:10.1016/0169-4332(89)90891-x
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(1989) 2nd International conference on chemical beam epitaxy and related growth techniques. Applied Surface Science, 37. 367pp. doi:10.1016/0169-4332(89)90497-2
 
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