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Fujitani, Hideaki, Asano, Setsuro (1990) Electronic structure of Si/disilicide interfaces. Applied Surface Science, 41. 164-168 doi:10.1016/0169-4332(89)90050-0

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Reference TypeJournal (article/letter/editorial)
TitleElectronic structure of Si/disilicide interfaces
JournalApplied Surface Science
AuthorsFujitani, HideakiAuthor
Asano, SetsuroAuthor
Year1990 (January)Volume41
PublisherElsevier BV
DOIdoi:10.1016/0169-4332(89)90050-0Search in ResearchGate
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Mindat Ref. ID9894920Long-form Identifiermindat:1:5:9894920:5
GUID0
Full ReferenceFujitani, Hideaki, Asano, Setsuro (1990) Electronic structure of Si/disilicide interfaces. Applied Surface Science, 41. 164-168 doi:10.1016/0169-4332(89)90050-0
Plain TextFujitani, Hideaki, Asano, Setsuro (1990) Electronic structure of Si/disilicide interfaces. Applied Surface Science, 41. 164-168 doi:10.1016/0169-4332(89)90050-0
In(n.d.) Applied Surface Science Vol. 41. Elsevier BV

See Also

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Fujitani, Hideaki, Asano, Setsuro (1992) Schottky barriers at epitaxial silicide/Si interfaces. Applied Surface Science, 56. 408-415 doi:10.1016/0169-4332(92)90262-v
Fujitani, Hideaki, Asano, Setsuro (1992) Calculated electronic structure at the CaF2/Si(111) interface. Surface Science, 268 (1). 265-274 doi:10.1016/0039-6028(92)90967-b
Fujitani, Hideaki, Asano, Setsuro (1990) Schottky barriers atNiSi2/Si(111) interfaces. Physical Review B, 42 (3) 1696-1704 doi:10.1103/physrevb.42.1696
Tung, R.T., Schrey, F. (1990) Epitaxial CoSi2/Si(111) interfaces. Applied Surface Science, 41. 223-229 doi:10.1016/0169-4332(89)90061-5
Ho, P.S. (1990) Chemistry and adhesion of metal-polymer interfaces. Applied Surface Science, 41. 559-566 doi:10.1016/0169-4332(89)90122-0
Fujitani, Hideaki, Asano, Setsuro (1994) Schottky-barrier height and electronic structure of the Si interface with metal silicides:CoSi2,NiSi2, andYSi2. Physical Review B, 50 (12) 8681-8698 doi:10.1103/physrevb.50.8681
(1990) Editorial Board. Applied Surface Science, 41. doi:10.1016/0169-4332(89)90023-8
(1990) Conference organization. Applied Surface Science, 41. doi:10.1016/0169-4332(89)90025-1
Hiraki, Akio (1990) Preface. Applied Surface Science, 41. doi:10.1016/0169-4332(89)90024-x
Fujimura, Norifumi, Tachibana, Shoji, Ito, Taichiro (1990) Characterization of Si-Rich WSix on Si. Applied Surface Science, 41. 286-289 doi:10.1016/0169-4332(89)90072-x
(1990) Author index. Applied Surface Science, 41. 654-661 doi:10.1016/0169-4332(89)90138-4
 
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