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Logothetidis, S., Alexandrou, I., Stoemenos, J. (1995) In-situ spectroscopic ellipsometry to control the growth of Ti nitride and carbide thin films. Applied Surface Science, 86. 185-189 doi:10.1016/0169-4332(94)00392-0

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Reference TypeJournal (article/letter/editorial)
TitleIn-situ spectroscopic ellipsometry to control the growth of Ti nitride and carbide thin films
JournalApplied Surface Science
AuthorsLogothetidis, S.Author
Alexandrou, I.Author
Stoemenos, J.Author
Year1995 (February)Volume86
PublisherElsevier BV
DOIdoi:10.1016/0169-4332(94)00392-0Search in ResearchGate
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Mindat Ref. ID9897582Long-form Identifiermindat:1:5:9897582:0
GUID0
Full ReferenceLogothetidis, S., Alexandrou, I., Stoemenos, J. (1995) In-situ spectroscopic ellipsometry to control the growth of Ti nitride and carbide thin films. Applied Surface Science, 86. 185-189 doi:10.1016/0169-4332(94)00392-0
Plain TextLogothetidis, S., Alexandrou, I., Stoemenos, J. (1995) In-situ spectroscopic ellipsometry to control the growth of Ti nitride and carbide thin films. Applied Surface Science, 86. 185-189 doi:10.1016/0169-4332(94)00392-0
In(n.d.) Applied Surface Science Vol. 86. Elsevier BV

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