Suntola, Tuomo (1996) Surface chemistry of materials deposition at atomic layer level. Applied Surface Science, 100. 391-398 doi:10.1016/0169-4332(96)00306-6
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Surface chemistry of materials deposition at atomic layer level | ||
Journal | Applied Surface Science | ||
Authors | Suntola, Tuomo | Author | |
Year | 1996 (July) | Volume | 100 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/0169-4332(96)00306-6Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 9898487 | Long-form Identifier | mindat:1:5:9898487:3 |
GUID | 0 | ||
Full Reference | Suntola, Tuomo (1996) Surface chemistry of materials deposition at atomic layer level. Applied Surface Science, 100. 391-398 doi:10.1016/0169-4332(96)00306-6 | ||
Plain Text | Suntola, Tuomo (1996) Surface chemistry of materials deposition at atomic layer level. Applied Surface Science, 100. 391-398 doi:10.1016/0169-4332(96)00306-6 | ||
In | (n.d.) Applied Surface Science Vol. 100. Elsevier BV |
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