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Sammelselg, V, Rosental, A, Tarre, A, Niinistö, L, Heiskanen, K, Ilmonen, K, Johansson, L.-S, Uustare, T (1998) TiO2 thin films by atomic layer deposition: a case of uneven growth at low temperature. Applied Surface Science, 134. 78-86 doi:10.1016/s0169-4332(98)00224-4

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Reference TypeJournal (article/letter/editorial)
TitleTiO2 thin films by atomic layer deposition: a case of uneven growth at low temperature
JournalApplied Surface Science
AuthorsSammelselg, VAuthor
Rosental, AAuthor
Tarre, AAuthor
Niinistö, LAuthor
Heiskanen, KAuthor
Ilmonen, KAuthor
Johansson, L.-SAuthor
Uustare, TAuthor
Year1998 (September)Volume134
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(98)00224-4Search in ResearchGate
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Mindat Ref. ID9900546Long-form Identifiermindat:1:5:9900546:5
GUID0
Full ReferenceSammelselg, V, Rosental, A, Tarre, A, Niinistö, L, Heiskanen, K, Ilmonen, K, Johansson, L.-S, Uustare, T (1998) TiO2 thin films by atomic layer deposition: a case of uneven growth at low temperature. Applied Surface Science, 134. 78-86 doi:10.1016/s0169-4332(98)00224-4
Plain TextSammelselg, V, Rosental, A, Tarre, A, Niinistö, L, Heiskanen, K, Ilmonen, K, Johansson, L.-S, Uustare, T (1998) TiO2 thin films by atomic layer deposition: a case of uneven growth at low temperature. Applied Surface Science, 134. 78-86 doi:10.1016/s0169-4332(98)00224-4
In(n.d.) Applied Surface Science Vol. 134. Elsevier BV

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Tarre, A, Rosental, A, Sammelselg, V, Uustare, T (2001) Comparative study of low-temperature chloride atomic-layer chemical vapor deposition of TiO2 and SnO2. Applied Surface Science, 175. 111-116 doi:10.1016/s0169-4332(01)00051-4
Aarik, J., Karlis, J., Mändar, H., Uustare, T., Sammelselg, V. (2001) Influence of structure development on atomic layer deposition of TiO2 thin films. Applied Surface Science, 181. 339-348 doi:10.1016/s0169-4332(01)00430-5
Rosental, A, Tarre, A, Adamson, P, Gerst, A, Kasikov, A, Niilisk, A (1999) Surface of TiO2 during atomic layer deposition as determined by incremental dielectric reflection. Applied Surface Science, 142. 204-209 doi:10.1016/s0169-4332(98)00706-5
Tarre, Aivar, Aarik, Jaan, Mändar, Hugo, Niilisk, Ahti, Pärna, Rainer, Rammula, Raul, Uustare, Teet, Rosental, Arnold, Sammelselg, Väino (2008) Atomic layer deposition of Cr2O3 thin films: Effect of crystallization on growth and properties. Applied Surface Science, 254. 5149-5156 doi:10.1016/j.apsusc.2008.02.016
Aarik, Jaan, Aidla, Aleks, Uustare, Teet, Kukli, Kaupo, Sammelselg, Väino, Ritala, Mikko, Leskelä, Markku (2002) Atomic layer deposition of TiO2 thin films from TiI4 and H2O. Applied Surface Science, 193. 277-286 doi:10.1016/s0169-4332(02)00497-x
Rosental, A, Adamson, P, Gerst, A, Koppel, H, Tarre, A (1997) Atomic layer deposition in traveling-wave reactor: In situ diagnostics by optical reflection. Applied Surface Science, 112. 82-86 doi:10.1016/s0169-4332(96)01003-3
Tarre, A., Rosental, A., Sundqvist, J., Hårsta, A., Uustare, T., Sammelselg, V. (2003) Nanoepitaxy of SnO2 on α-Al2O3(012). Surface Science, 532. 514-518 doi:10.1016/s0039-6028(03)00476-x
Niilisk, A., Rosental, A., Uustare, T., Kasikov, A., Tarre, A. (2001) Chloride atomic-layer chemical vapor deposition of TiO2 with a chloride pretreatment of substrates. Le Journal de Physique IV, 11. doi:10.1051/jp4:20011116
Kukli, K., Peussa, M., Johansson, L.-S., Nykänen, E., Niinistö, L. (1999) Controlled Growth of Yttrium Oxysulphide Thin Films by Atomic Layer Deposition. Materials Science Forum, 315. 216-221 doi:10.4028/www.scientific.net/msf.315-317.216
Aarik, Jaan, Aidla, Aleks, Uustare, Teet, Sammelselg, Väino (1995) Morphology and structure of TiO2 thin films grown by atomic layer deposition. Journal of Crystal Growth, 148 (3). 268-275 doi:10.1016/0022-0248(94)00874-4
Aarik, J., Aidla, A., Mändar, H., Uustare, T. (2001) Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism. Applied Surface Science, 172. 148-158 doi:10.1016/s0169-4332(00)00842-4
 
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