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Kawasaki, Mitsuo (1998) Contribution of low-energy ion bombardment to the growth of atomically flat Ag(111) and Au(111) films by glow discharge sputtering. Applied Surface Science, 135. 115-120 doi:10.1016/s0169-4332(98)00270-0

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Reference TypeJournal (article/letter/editorial)
TitleContribution of low-energy ion bombardment to the growth of atomically flat Ag(111) and Au(111) films by glow discharge sputtering
JournalApplied Surface Science
AuthorsKawasaki, MitsuoAuthor
Year1998 (September)Volume135
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(98)00270-0Search in ResearchGate
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Mindat Ref. ID9900587Long-form Identifiermindat:1:5:9900587:2
GUID0
Full ReferenceKawasaki, Mitsuo (1998) Contribution of low-energy ion bombardment to the growth of atomically flat Ag(111) and Au(111) films by glow discharge sputtering. Applied Surface Science, 135. 115-120 doi:10.1016/s0169-4332(98)00270-0
Plain TextKawasaki, Mitsuo (1998) Contribution of low-energy ion bombardment to the growth of atomically flat Ag(111) and Au(111) films by glow discharge sputtering. Applied Surface Science, 135. 115-120 doi:10.1016/s0169-4332(98)00270-0
In(n.d.) Applied Surface Science Vol. 135. Elsevier BV

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Kawasaki, Mitsuo, Uchiki, Hideki (1997) Sputter deposition of atomically flat Au(111) and Ag(111) films. Surface Science, 388 (1). doi:10.1016/s0039-6028(97)00516-5
Kim, J.C., Ji, J.-Y., Kline, J.S., Tucker, J.R., Shen, T.-C. (2003) Preparation of atomically clean and flat Si(1 0 0) surfaces by low-energy ion sputtering and low-temperature annealing. Applied Surface Science, 220. 293-297 doi:10.1016/s0169-4332(03)00826-2
Sato, Shinri, Tanaka, Seiji (1998) Photodissociation of iron pentacarbonyl adsorbed on Ag(111). Applied Surface Science, 135. 83-90 doi:10.1016/s0169-4332(98)00280-3
Petravić, Mladen (1998) On the segregation of metals during low-energy oxygen bombardment of silicon. Applied Surface Science, 135. 200-204 doi:10.1016/s0169-4332(98)00274-8
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Iwanowski, R.J, Heinonen, M.H, Raczyńska, J, Fronc, K (2000) XPS analysis of surface compositional changes in InSb1−xBix (111) due to low-energy Ar+ ion bombardment. Applied Surface Science, 153. 193-199 doi:10.1016/s0169-4332(99)00485-7
Krawczyk, M. (1998) Decomposition of diborane on Pd(111): thermal and chemical behaviour of surface boron. Applied Surface Science, 135. 209-217 doi:10.1016/s0169-4332(98)00259-1
Nagashima, Seiichi (1999) Growth modes and surface structures of Te overlayers deposited on Au(111) surfaces. Applied Surface Science, 144. 73-77 doi:10.1016/s0169-4332(98)00768-5
Okumura, H, Ishikawa, T, Akane, T, Sano, M, Matsumoto, S (1998) Low temperature growth of Si on Si(111) by gas-source MBE with rapid thermal annealing: AFM study on surface morphology. Applied Surface Science, 135. 121-128 doi:10.1016/s0169-4332(98)00272-4
 
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