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Wang, Shuangbao, Liang, Hong, Zhu, Peiran (2000) Characteristics of CrSi2 and Cr(Ni)Si2 synthesis in MEVVA ion source implantation and post-annealing processes. Applied Surface Science, 153. 108-113 doi:10.1016/s0169-4332(99)00360-8

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Reference TypeJournal (article/letter/editorial)
TitleCharacteristics of CrSi2 and Cr(Ni)Si2 synthesis in MEVVA ion source implantation and post-annealing processes
JournalApplied Surface Science
AuthorsWang, ShuangbaoAuthor
Liang, HongAuthor
Zhu, PeiranAuthor
Year2000 (January)Volume153
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(99)00360-8Search in ResearchGate
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Mindat Ref. ID9901598Long-form Identifiermindat:1:5:9901598:5
GUID0
Full ReferenceWang, Shuangbao, Liang, Hong, Zhu, Peiran (2000) Characteristics of CrSi2 and Cr(Ni)Si2 synthesis in MEVVA ion source implantation and post-annealing processes. Applied Surface Science, 153. 108-113 doi:10.1016/s0169-4332(99)00360-8
Plain TextWang, Shuangbao, Liang, Hong, Zhu, Peiran (2000) Characteristics of CrSi2 and Cr(Ni)Si2 synthesis in MEVVA ion source implantation and post-annealing processes. Applied Surface Science, 153. 108-113 doi:10.1016/s0169-4332(99)00360-8
In(n.d.) Applied Surface Science Vol. 153. Elsevier BV

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