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Sato, Keisuke, Izumi, Tomio, Iwase, Mitsuo, Show, Yoshiyuki, Morisaki, Hiroshi, Yaguchi, Toshie, Kamino, Takeo (2003) Nucleation and growth of nanocrystalline silicon studied by TEM, XPS and ESR. Applied Surface Science, 216. 376-381 doi:10.1016/s0169-4332(03)00445-8

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Reference TypeJournal (article/letter/editorial)
TitleNucleation and growth of nanocrystalline silicon studied by TEM, XPS and ESR
JournalApplied Surface Science
AuthorsSato, KeisukeAuthor
Izumi, TomioAuthor
Iwase, MitsuoAuthor
Show, YoshiyukiAuthor
Morisaki, HiroshiAuthor
Yaguchi, ToshieAuthor
Kamino, TakeoAuthor
Year2003 (June)Volume216
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(03)00445-8Search in ResearchGate
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Mindat Ref. ID9905301Long-form Identifiermindat:1:5:9905301:9
GUID0
Full ReferenceSato, Keisuke, Izumi, Tomio, Iwase, Mitsuo, Show, Yoshiyuki, Morisaki, Hiroshi, Yaguchi, Toshie, Kamino, Takeo (2003) Nucleation and growth of nanocrystalline silicon studied by TEM, XPS and ESR. Applied Surface Science, 216. 376-381 doi:10.1016/s0169-4332(03)00445-8
Plain TextSato, Keisuke, Izumi, Tomio, Iwase, Mitsuo, Show, Yoshiyuki, Morisaki, Hiroshi, Yaguchi, Toshie, Kamino, Takeo (2003) Nucleation and growth of nanocrystalline silicon studied by TEM, XPS and ESR. Applied Surface Science, 216. 376-381 doi:10.1016/s0169-4332(03)00445-8
In(n.d.) Applied Surface Science Vol. 216. Elsevier BV

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Sandhu, A., Show, Y., Katano, T., Iwase, M., Izumi, T., Yabe, T., Nozaki, S., Morisaki, H. (1997) Properties of silicon doped silicon dioxide thin films deposited by Co-sputtering of silicon and silicon dioxide. Applied Surface Science, 117. 634-637 doi:10.1016/s0169-4332(97)80156-0
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Shimasaki, M., Show, Y., Iwase, M., Izumi, T., Ichinohe, T., Nozaki, S., Morisaki, H. (1996) Correlation between light emission and dangling bonds in porous silicon. Applied Surface Science, 92. 617-620 doi:10.1016/0169-4332(95)00304-5
Show, Yoshiyuki, Matsukawa, Toshikazu, Iwase, Mitsuo, Izumi, Tomio (2001) Effects of defects introduced by nitrogen doping on electron emission from diamond films. Materials Chemistry and Physics, 72. 201-203 doi:10.1016/s0254-0584(01)00436-9
Show, Yoshiyuki, Matsukawa, Toshikazu, Ito, Hirokazu, Iwase, Mitsuo, Izumi, Tomio (2000) Improved Electron Emission from Defective Diamond Film Deposited by CVD Method. Materials Science Forum, 338. 1557-1560 doi:10.4028/www.scientific.net/msf.338-342.1557
(2003) Editorial Board. Applied Surface Science, 216. doi:10.1016/s0169-4332(03)00776-1
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Show, Yoshiyuki, Matsuoka, Fumihiko, Hayashi, Masaharu, Ito, Hirokazu, Iwase, Mitsuo, Izumi, Tomio (1998) Influence of defects on electron emission from diamond films. Journal of Applied Physics, 84 (11). 6351-6354 doi:10.1063/1.368961
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Uchitomi, Naotaka, Sato, Sin’ya, Jinbo, Yoshio (2003) Growth and annealing effect of ferromagnetic (Ga, Mn)As on Si(1 0 0) substrates. Applied Surface Science, 216. 607-613 doi:10.1016/s0169-4332(03)00463-x
 
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