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Zhou, Zhimin, Xia, Lifang, Sun, Mingren (2004) The investigation of carbon nitride films deposited at various substrate temperatures and N2/Ar flow ratios by vacuum cathodic arc method. Applied Surface Science, 222. 327-337 doi:10.1016/j.apsusc.2003.09.002

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Reference TypeJournal (article/letter/editorial)
TitleThe investigation of carbon nitride films deposited at various substrate temperatures and N2/Ar flow ratios by vacuum cathodic arc method
JournalApplied Surface Science
AuthorsZhou, ZhiminAuthor
Xia, LifangAuthor
Sun, MingrenAuthor
Year2004 (January)Volume222
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2003.09.002Search in ResearchGate
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Mindat Ref. ID9905651Long-form Identifiermindat:1:5:9905651:1
GUID0
Full ReferenceZhou, Zhimin, Xia, Lifang, Sun, Mingren (2004) The investigation of carbon nitride films deposited at various substrate temperatures and N2/Ar flow ratios by vacuum cathodic arc method. Applied Surface Science, 222. 327-337 doi:10.1016/j.apsusc.2003.09.002
Plain TextZhou, Zhimin, Xia, Lifang, Sun, Mingren (2004) The investigation of carbon nitride films deposited at various substrate temperatures and N2/Ar flow ratios by vacuum cathodic arc method. Applied Surface Science, 222. 327-337 doi:10.1016/j.apsusc.2003.09.002
In(n.d.) Applied Surface Science Vol. 222. Elsevier BV

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