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Yamamoto, Shigehiko (2005) Electron emission and work function—Past, present and future. Applied Surface Science, 251. 4-13 doi:10.1016/j.apsusc.2005.03.115

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Reference TypeJournal (article/letter/editorial)
TitleElectron emission and work function—Past, present and future
JournalApplied Surface Science
AuthorsYamamoto, ShigehikoAuthor
Year2005 (September)Volume251
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2005.03.115Search in ResearchGate
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Mindat Ref. ID9907812Long-form Identifiermindat:1:5:9907812:4
GUID0
Full ReferenceYamamoto, Shigehiko (2005) Electron emission and work function—Past, present and future. Applied Surface Science, 251. 4-13 doi:10.1016/j.apsusc.2005.03.115
Plain TextYamamoto, Shigehiko (2005) Electron emission and work function—Past, present and future. Applied Surface Science, 251. 4-13 doi:10.1016/j.apsusc.2005.03.115
In(n.d.) Applied Surface Science Vol. 251. Elsevier BV

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Yamamoto, Shigehiko, Watanabe, Isato, Sasaki, Susumu, Yaguchi, Tomio (1992) Absolute work function measurements with the retarding potential method utilizing a field emission electron source. Surface Science, 266 (1). 100-106 doi:10.1016/0039-6028(92)91004-u
Cazaux, Jacques (2010) Calculated influence of work function on SE escape probability and Secondary Electron Emission yield. Applied Surface Science, 257. 1002-1009 doi:10.1016/j.apsusc.2010.08.007
Song, Weijie, Yoshitake, Michiko (2005) A work function study of ultra-thin alumina formation on NiAl(110) surface. Applied Surface Science, 251. 14-18 doi:10.1016/j.apsusc.2005.03.116
Sada, Y., Meguro, T. (2020) Study on work function and corresponding electron emission during NEA activation of GaAs surfaces. Applied Surface Science, 513. 145699pp. doi:10.1016/j.apsusc.2020.145699
Zeng, Baoqing, Tian, Shikai, Yang, Zhonghai (2005) Field electron emission from branched nanotubes film. Applied Surface Science, 251. 245-248 doi:10.1016/j.apsusc.2005.03.156
Komai, Masaaki, Sasaki, Masahiro, Ozawa, Ryo, Yamamoto, Shigehiko (1999) Microscopical analysis of structure and work function of Ba-covered Si(111)-(7×7) surface. Applied Surface Science, 146. 158-161 doi:10.1016/s0169-4332(99)00010-0
Hayakawa, Kazunobu, Okano, Hiroshi, Kawase, Susumu, Yamamoto, Shigehiko (1974) Auger Electron Emission Micrography and Microanalysis of Solid Surface. Japanese Journal of Applied Physics, 13. 803 doi:10.7567/jjaps.2s2.803
Miya, Kenta, Sinsarp, Asawin, Sasaki, Masahiro, Yamamoto, Shigehiko (2005) Microscopic Study of Work Function of Ag-Deposited Pt(111) and Ag/Pt Surface Alloy. Japanese Journal of Applied Physics, 44 (1) doi:10.1143/jjap.44.l31
Hasegawa, H., Akazawa, M., Domanowska, A., Adamowicz, B. (2010) Surface passivation of III–V semiconductors for future CMOS devices—Past research, present status and key issues for future. Applied Surface Science, 256. 5698-5707 doi:10.1016/j.apsusc.2010.03.091
Midgley, PA (2007) Electron Precession: Past, Present and Future. Microscopy and Microanalysis, 13. doi:10.1017/s1431927607072881
Gu, C.Z. (2005) Enhanced electron emission from diamond film deposited on pre-seeded Si substrate with nanosized diamond power. Applied Surface Science, 251. 225-229 doi:10.1016/j.apsusc.2005.03.179
 
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