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Kim, Dong-Ho, Park, Mi-Rang, Lee, Hak-Jun, Lee, Gun-Hwan (2006) Thickness dependence of electrical properties of ITO film deposited on a plastic substrate by RF magnetron sputtering. Applied Surface Science, 253. 409-411 doi:10.1016/j.apsusc.2005.12.097

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Reference TypeJournal (article/letter/editorial)
TitleThickness dependence of electrical properties of ITO film deposited on a plastic substrate by RF magnetron sputtering
JournalApplied Surface Science
AuthorsKim, Dong-HoAuthor
Park, Mi-RangAuthor
Lee, Hak-JunAuthor
Lee, Gun-HwanAuthor
Year2006 (November)Volume253
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2005.12.097Search in ResearchGate
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Mindat Ref. ID9910029Long-form Identifiermindat:1:5:9910029:2
GUID0
Full ReferenceKim, Dong-Ho, Park, Mi-Rang, Lee, Hak-Jun, Lee, Gun-Hwan (2006) Thickness dependence of electrical properties of ITO film deposited on a plastic substrate by RF magnetron sputtering. Applied Surface Science, 253. 409-411 doi:10.1016/j.apsusc.2005.12.097
Plain TextKim, Dong-Ho, Park, Mi-Rang, Lee, Hak-Jun, Lee, Gun-Hwan (2006) Thickness dependence of electrical properties of ITO film deposited on a plastic substrate by RF magnetron sputtering. Applied Surface Science, 253. 409-411 doi:10.1016/j.apsusc.2005.12.097
In(n.d.) Applied Surface Science Vol. 253. Elsevier BV

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