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He, Xiliang, Wu, Jiehua, Wu, Lingnan, Zhao, Lili, Gao, Xiangdong, Li, Xiaomin (2008) Structure, morphology and optical properties of SiO2−x thin films prepared by plasma-assisted pulsed laser deposition. Applied Surface Science, 254. 1730-1735 doi:10.1016/j.apsusc.2007.07.127

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Reference TypeJournal (article/letter/editorial)
TitleStructure, morphology and optical properties of SiO2−x thin films prepared by plasma-assisted pulsed laser deposition
JournalApplied Surface Science
AuthorsHe, XiliangAuthor
Wu, JiehuaAuthor
Wu, LingnanAuthor
Zhao, LiliAuthor
Gao, XiangdongAuthor
Li, XiaominAuthor
Year2008 (January)Volume254
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2007.07.127Search in ResearchGate
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Mindat Ref. ID9912092Long-form Identifiermindat:1:5:9912092:2
GUID0
Full ReferenceHe, Xiliang, Wu, Jiehua, Wu, Lingnan, Zhao, Lili, Gao, Xiangdong, Li, Xiaomin (2008) Structure, morphology and optical properties of SiO2−x thin films prepared by plasma-assisted pulsed laser deposition. Applied Surface Science, 254. 1730-1735 doi:10.1016/j.apsusc.2007.07.127
Plain TextHe, Xiliang, Wu, Jiehua, Wu, Lingnan, Zhao, Lili, Gao, Xiangdong, Li, Xiaomin (2008) Structure, morphology and optical properties of SiO2−x thin films prepared by plasma-assisted pulsed laser deposition. Applied Surface Science, 254. 1730-1735 doi:10.1016/j.apsusc.2007.07.127
In(n.d.) Applied Surface Science Vol. 254. Elsevier BV

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