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Tang, Zeguo, Wang, Wenbin, Zhou, Bo, Wang, Desheng, Peng, Shanglong, He, Deyan (2009) The influence of H2/(H2+Ar) ratio on microstructure and optoelectronic properties of microcrystalline silicon films deposited by plasma-enhanced CVD. Applied Surface Science, 255. 8867-8873 doi:10.1016/j.apsusc.2009.06.074

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Reference TypeJournal (article/letter/editorial)
TitleThe influence of H2/(H2+Ar) ratio on microstructure and optoelectronic properties of microcrystalline silicon films deposited by plasma-enhanced CVD
JournalApplied Surface Science
AuthorsTang, ZeguoAuthor
Wang, WenbinAuthor
Zhou, BoAuthor
Wang, DeshengAuthor
Peng, ShanglongAuthor
He, DeyanAuthor
Year2009 (August)Volume255
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2009.06.074Search in ResearchGate
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Mindat Ref. ID9913145Long-form Identifiermindat:1:5:9913145:0
GUID0
Full ReferenceTang, Zeguo, Wang, Wenbin, Zhou, Bo, Wang, Desheng, Peng, Shanglong, He, Deyan (2009) The influence of H2/(H2+Ar) ratio on microstructure and optoelectronic properties of microcrystalline silicon films deposited by plasma-enhanced CVD. Applied Surface Science, 255. 8867-8873 doi:10.1016/j.apsusc.2009.06.074
Plain TextTang, Zeguo, Wang, Wenbin, Zhou, Bo, Wang, Desheng, Peng, Shanglong, He, Deyan (2009) The influence of H2/(H2+Ar) ratio on microstructure and optoelectronic properties of microcrystalline silicon films deposited by plasma-enhanced CVD. Applied Surface Science, 255. 8867-8873 doi:10.1016/j.apsusc.2009.06.074
In(n.d.) Applied Surface Science Vol. 255. Elsevier BV

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