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Xing, An, Gao, Yuan, Yin, Jungang, Ren, Guangjuan, Liu, Huitao, Ma, Mianjun (2010) Preparation and atomic oxygen erosion resistance of silica film formed on silicon rubber by sol–gel method. Applied Surface Science, 256. 6133-6138 doi:10.1016/j.apsusc.2010.03.133

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Reference TypeJournal (article/letter/editorial)
TitlePreparation and atomic oxygen erosion resistance of silica film formed on silicon rubber by sol–gel method
JournalApplied Surface Science
AuthorsXing, AnAuthor
Gao, YuanAuthor
Yin, JungangAuthor
Ren, GuangjuanAuthor
Liu, HuitaoAuthor
Ma, MianjunAuthor
Year2010 (August)Volume256
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2010.03.133Search in ResearchGate
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Mindat Ref. ID9914882Long-form Identifiermindat:1:5:9914882:1
GUID0
Full ReferenceXing, An, Gao, Yuan, Yin, Jungang, Ren, Guangjuan, Liu, Huitao, Ma, Mianjun (2010) Preparation and atomic oxygen erosion resistance of silica film formed on silicon rubber by sol–gel method. Applied Surface Science, 256. 6133-6138 doi:10.1016/j.apsusc.2010.03.133
Plain TextXing, An, Gao, Yuan, Yin, Jungang, Ren, Guangjuan, Liu, Huitao, Ma, Mianjun (2010) Preparation and atomic oxygen erosion resistance of silica film formed on silicon rubber by sol–gel method. Applied Surface Science, 256. 6133-6138 doi:10.1016/j.apsusc.2010.03.133
In(n.d.) Applied Surface Science Vol. 256. Elsevier BV

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