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Rao, A. Venkateswara, Latthe, Sanjay S., Dhere, Sunetra L., Pawar, Swapnali S., Imai, Hiroaki, Ganesan, V., Gupta, Satish C., Wagh, Pratap B. (2010) Control on wetting properties of spin-deposited silica films by surface silylation method. Applied Surface Science, 256. 2115-2121 doi:10.1016/j.apsusc.2009.09.057

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Reference TypeJournal (article/letter/editorial)
TitleControl on wetting properties of spin-deposited silica films by surface silylation method
JournalApplied Surface Science
AuthorsRao, A. VenkateswaraAuthor
Latthe, Sanjay S.Author
Dhere, Sunetra L.Author
Pawar, Swapnali S.Author
Imai, HiroakiAuthor
Ganesan, V.Author
Gupta, Satish C.Author
Wagh, Pratap B.Author
Year2010 (January)Volume256
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2009.09.057Search in ResearchGate
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Mindat Ref. ID9915466Long-form Identifiermindat:1:5:9915466:4
GUID0
Full ReferenceRao, A. Venkateswara, Latthe, Sanjay S., Dhere, Sunetra L., Pawar, Swapnali S., Imai, Hiroaki, Ganesan, V., Gupta, Satish C., Wagh, Pratap B. (2010) Control on wetting properties of spin-deposited silica films by surface silylation method. Applied Surface Science, 256. 2115-2121 doi:10.1016/j.apsusc.2009.09.057
Plain TextRao, A. Venkateswara, Latthe, Sanjay S., Dhere, Sunetra L., Pawar, Swapnali S., Imai, Hiroaki, Ganesan, V., Gupta, Satish C., Wagh, Pratap B. (2010) Control on wetting properties of spin-deposited silica films by surface silylation method. Applied Surface Science, 256. 2115-2121 doi:10.1016/j.apsusc.2009.09.057
In(n.d.) Applied Surface Science Vol. 256. Elsevier BV

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