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Barve, S.A., Jagannath, , Deo, M.N., Kishore, R., Biswas, A., Gantayet, L.M., Patil, D.S. (2010) Effect of argon ion activity on the properties of Y2O3 thin films deposited by low pressure PACVD. Applied Surface Science, 257. 215-221 doi:10.1016/j.apsusc.2010.06.067

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Reference TypeJournal (article/letter/editorial)
TitleEffect of argon ion activity on the properties of Y2O3 thin films deposited by low pressure PACVD
JournalApplied Surface Science
AuthorsBarve, S.A.Author
Jagannath, Author
Deo, M.N.Author
Kishore, R.Author
Biswas, A.Author
Gantayet, L.M.Author
Patil, D.S.Author
Year2010 (October)Volume257
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2010.06.067Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID9915654Long-form Identifiermindat:1:5:9915654:7
GUID0
Full ReferenceBarve, S.A., Jagannath, , Deo, M.N., Kishore, R., Biswas, A., Gantayet, L.M., Patil, D.S. (2010) Effect of argon ion activity on the properties of Y2O3 thin films deposited by low pressure PACVD. Applied Surface Science, 257. 215-221 doi:10.1016/j.apsusc.2010.06.067
Plain TextBarve, S.A., Jagannath, , Deo, M.N., Kishore, R., Biswas, A., Gantayet, L.M., Patil, D.S. (2010) Effect of argon ion activity on the properties of Y2O3 thin films deposited by low pressure PACVD. Applied Surface Science, 257. 215-221 doi:10.1016/j.apsusc.2010.06.067
In(n.d.) Applied Surface Science Vol. 257. Elsevier BV

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