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Huang, Yongxian, Tian, Xiubo, Lv, Shixiong, Yang, Shiqin, Fu, R.K.Y., Chu, Paul K., Leng, Jinsong, Li, Yao (2011) An undercutting model of atomic oxygen for multilayer silica/alumina films fabricated by plasma immersion implantation and deposition on polyimide. Applied Surface Science, 257. 9158-9163 doi:10.1016/j.apsusc.2011.05.124

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Reference TypeJournal (article/letter/editorial)
TitleAn undercutting model of atomic oxygen for multilayer silica/alumina films fabricated by plasma immersion implantation and deposition on polyimide
JournalApplied Surface Science
AuthorsHuang, YongxianAuthor
Tian, XiuboAuthor
Lv, ShixiongAuthor
Yang, ShiqinAuthor
Fu, R.K.Y.Author
Chu, Paul K.Author
Leng, JinsongAuthor
Li, YaoAuthor
Year2011 (August)Volume257
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2011.05.124Search in ResearchGate
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Mindat Ref. ID9916508Long-form Identifiermindat:1:5:9916508:6
GUID0
Full ReferenceHuang, Yongxian, Tian, Xiubo, Lv, Shixiong, Yang, Shiqin, Fu, R.K.Y., Chu, Paul K., Leng, Jinsong, Li, Yao (2011) An undercutting model of atomic oxygen for multilayer silica/alumina films fabricated by plasma immersion implantation and deposition on polyimide. Applied Surface Science, 257. 9158-9163 doi:10.1016/j.apsusc.2011.05.124
Plain TextHuang, Yongxian, Tian, Xiubo, Lv, Shixiong, Yang, Shiqin, Fu, R.K.Y., Chu, Paul K., Leng, Jinsong, Li, Yao (2011) An undercutting model of atomic oxygen for multilayer silica/alumina films fabricated by plasma immersion implantation and deposition on polyimide. Applied Surface Science, 257. 9158-9163 doi:10.1016/j.apsusc.2011.05.124
In(n.d.) Applied Surface Science Vol. 257. Elsevier BV


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