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Kafrouni, W., Rouessac, V., Julbe, A., Durand, J. (2010) Synthesis and characterization of silicon carbonitride films by plasma enhanced chemical vapor deposition (PECVD) using bis(dimethylamino)dimethylsilane (BDMADMS), as membrane for a small molecule gas separation. Applied Surface Science, 257. 1196-1203 doi:10.1016/j.apsusc.2010.08.013

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Reference TypeJournal (article/letter/editorial)
TitleSynthesis and characterization of silicon carbonitride films by plasma enhanced chemical vapor deposition (PECVD) using bis(dimethylamino)dimethylsilane (BDMADMS), as membrane for a small molecule gas separation
JournalApplied Surface Science
AuthorsKafrouni, W.Author
Rouessac, V.Author
Julbe, A.Author
Durand, J.Author
Year2010 (December)Volume257
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2010.08.013Search in ResearchGate
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Mindat Ref. ID9916881Long-form Identifiermindat:1:5:9916881:6
GUID0
Full ReferenceKafrouni, W., Rouessac, V., Julbe, A., Durand, J. (2010) Synthesis and characterization of silicon carbonitride films by plasma enhanced chemical vapor deposition (PECVD) using bis(dimethylamino)dimethylsilane (BDMADMS), as membrane for a small molecule gas separation. Applied Surface Science, 257. 1196-1203 doi:10.1016/j.apsusc.2010.08.013
Plain TextKafrouni, W., Rouessac, V., Julbe, A., Durand, J. (2010) Synthesis and characterization of silicon carbonitride films by plasma enhanced chemical vapor deposition (PECVD) using bis(dimethylamino)dimethylsilane (BDMADMS), as membrane for a small molecule gas separation. Applied Surface Science, 257. 1196-1203 doi:10.1016/j.apsusc.2010.08.013
In(n.d.) Applied Surface Science Vol. 257. Elsevier BV

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