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Ding, J.N., Ye, F., Yuan, N.Y., Tan, C.B., Zhu, Y.Y., Ding, G.Q., Chen, Z.H. (2010) The relationship of etching behavior and crystal orientation of aluminum doped zinc oxide films. Applied Surface Science, 257. 1420-1424 doi:10.1016/j.apsusc.2010.08.054

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Reference TypeJournal (article/letter/editorial)
TitleThe relationship of etching behavior and crystal orientation of aluminum doped zinc oxide films
JournalApplied Surface Science
AuthorsDing, J.N.Author
Ye, F.Author
Yuan, N.Y.Author
Tan, C.B.Author
Zhu, Y.Y.Author
Ding, G.Q.Author
Chen, Z.H.Author
Year2010 (December)Volume257
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2010.08.054Search in ResearchGate
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Mindat Ref. ID9916920Long-form Identifiermindat:1:5:9916920:4
GUID0
Full ReferenceDing, J.N., Ye, F., Yuan, N.Y., Tan, C.B., Zhu, Y.Y., Ding, G.Q., Chen, Z.H. (2010) The relationship of etching behavior and crystal orientation of aluminum doped zinc oxide films. Applied Surface Science, 257. 1420-1424 doi:10.1016/j.apsusc.2010.08.054
Plain TextDing, J.N., Ye, F., Yuan, N.Y., Tan, C.B., Zhu, Y.Y., Ding, G.Q., Chen, Z.H. (2010) The relationship of etching behavior and crystal orientation of aluminum doped zinc oxide films. Applied Surface Science, 257. 1420-1424 doi:10.1016/j.apsusc.2010.08.054
In(n.d.) Applied Surface Science Vol. 257. Elsevier BV

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