Ahn, Min Hyung, Cho, Eou-Sik, Kwon, Sang Jik (2011) Effect of the duty ratio on the indium tin oxide (ITO) film deposited by in-line pulsed DC magnetron sputtering method for resistive touch panel. Applied Surface Science, 258. 1242-1248 doi:10.1016/j.apsusc.2011.09.081
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Effect of the duty ratio on the indium tin oxide (ITO) film deposited by in-line pulsed DC magnetron sputtering method for resistive touch panel | ||
Journal | Applied Surface Science | ||
Authors | Ahn, Min Hyung | Author | |
Cho, Eou-Sik | Author | ||
Kwon, Sang Jik | Author | ||
Year | 2011 (November) | Volume | 258 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/j.apsusc.2011.09.081Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 9918612 | Long-form Identifier | mindat:1:5:9918612:2 |
GUID | 0 | ||
Full Reference | Ahn, Min Hyung, Cho, Eou-Sik, Kwon, Sang Jik (2011) Effect of the duty ratio on the indium tin oxide (ITO) film deposited by in-line pulsed DC magnetron sputtering method for resistive touch panel. Applied Surface Science, 258. 1242-1248 doi:10.1016/j.apsusc.2011.09.081 | ||
Plain Text | Ahn, Min Hyung, Cho, Eou-Sik, Kwon, Sang Jik (2011) Effect of the duty ratio on the indium tin oxide (ITO) film deposited by in-line pulsed DC magnetron sputtering method for resistive touch panel. Applied Surface Science, 258. 1242-1248 doi:10.1016/j.apsusc.2011.09.081 | ||
In | (n.d.) Applied Surface Science Vol. 258. Elsevier BV |
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