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Fernandes, F., Loureiro, A., Polcar, T., Cavaleiro, A. (2014) The effect of increasing V content on the structure, mechanical properties and oxidation resistance of Ti–Si–V–N films deposited by DC reactive magnetron sputtering. Applied Surface Science, 289. 114-123 doi:10.1016/j.apsusc.2013.10.117

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Reference TypeJournal (article/letter/editorial)
TitleThe effect of increasing V content on the structure, mechanical properties and oxidation resistance of Ti–Si–V–N films deposited by DC reactive magnetron sputtering
JournalApplied Surface Science
AuthorsFernandes, F.Author
Loureiro, A.Author
Polcar, T.Author
Cavaleiro, A.Author
Year2014 (January)Volume289
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2013.10.117Search in ResearchGate
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Mindat Ref. ID9921917Long-form Identifiermindat:1:5:9921917:4
GUID0
Full ReferenceFernandes, F., Loureiro, A., Polcar, T., Cavaleiro, A. (2014) The effect of increasing V content on the structure, mechanical properties and oxidation resistance of Ti–Si–V–N films deposited by DC reactive magnetron sputtering. Applied Surface Science, 289. 114-123 doi:10.1016/j.apsusc.2013.10.117
Plain TextFernandes, F., Loureiro, A., Polcar, T., Cavaleiro, A. (2014) The effect of increasing V content on the structure, mechanical properties and oxidation resistance of Ti–Si–V–N films deposited by DC reactive magnetron sputtering. Applied Surface Science, 289. 114-123 doi:10.1016/j.apsusc.2013.10.117
In(n.d.) Applied Surface Science Vol. 289. Elsevier BV

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