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Zhang, Zhonghua, Song, Sannian, Song, Zhitang, Cheng, Yan, Zhu, Min, Li, Xiaoyun, Zhu, Yueqin, Guo, Xiaohui, Yin, Weijun, Wu, Liangcai, Liu, Bo, Feng, Songlin, Zhou, Dong (2014) Etching of new phase change material Ti0.5Sb2Te3 by Cl2/Ar and CF4/Ar inductively coupled plasmas. Applied Surface Science, 311. 68-73 doi:10.1016/j.apsusc.2014.05.002

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Reference TypeJournal (article/letter/editorial)
TitleEtching of new phase change material Ti0.5Sb2Te3 by Cl2/Ar and CF4/Ar inductively coupled plasmas
JournalApplied Surface Science
AuthorsZhang, ZhonghuaAuthor
Song, SannianAuthor
Song, ZhitangAuthor
Cheng, YanAuthor
Zhu, MinAuthor
Li, XiaoyunAuthor
Zhu, YueqinAuthor
Guo, XiaohuiAuthor
Yin, WeijunAuthor
Wu, LiangcaiAuthor
Liu, BoAuthor
Feng, SonglinAuthor
Zhou, DongAuthor
Year2014 (August)Volume311
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2014.05.002Search in ResearchGate
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Mindat Ref. ID9923184Long-form Identifiermindat:1:5:9923184:8
GUID0
Full ReferenceZhang, Zhonghua, Song, Sannian, Song, Zhitang, Cheng, Yan, Zhu, Min, Li, Xiaoyun, Zhu, Yueqin, Guo, Xiaohui, Yin, Weijun, Wu, Liangcai, Liu, Bo, Feng, Songlin, Zhou, Dong (2014) Etching of new phase change material Ti0.5Sb2Te3 by Cl2/Ar and CF4/Ar inductively coupled plasmas. Applied Surface Science, 311. 68-73 doi:10.1016/j.apsusc.2014.05.002
Plain TextZhang, Zhonghua, Song, Sannian, Song, Zhitang, Cheng, Yan, Zhu, Min, Li, Xiaoyun, Zhu, Yueqin, Guo, Xiaohui, Yin, Weijun, Wu, Liangcai, Liu, Bo, Feng, Songlin, Zhou, Dong (2014) Etching of new phase change material Ti0.5Sb2Te3 by Cl2/Ar and CF4/Ar inductively coupled plasmas. Applied Surface Science, 311. 68-73 doi:10.1016/j.apsusc.2014.05.002
In(n.d.) Applied Surface Science Vol. 311. Elsevier BV

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