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Sanal, K.C., Jayaraj, M.K. (2014) Room temperature deposited p-channel amorphous Cu 1−x Cr x O 2−δ thin film transistors. Applied Surface Science, 315. 274-278 doi:10.1016/j.apsusc.2014.07.107

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Reference TypeJournal (article/letter/editorial)
TitleRoom temperature deposited p-channel amorphous Cu 1−x Cr x O 2−δ thin film transistors
JournalApplied Surface Science
AuthorsSanal, K.C.Author
Jayaraj, M.K.Author
Year2014 (October)Volume315
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2014.07.107Search in ResearchGate
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Mindat Ref. ID9923664Long-form Identifiermindat:1:5:9923664:9
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Full ReferenceSanal, K.C., Jayaraj, M.K. (2014) Room temperature deposited p-channel amorphous Cu 1−x Cr x O 2−δ thin film transistors. Applied Surface Science, 315. 274-278 doi:10.1016/j.apsusc.2014.07.107
Plain TextSanal, K.C., Jayaraj, M.K. (2014) Room temperature deposited p-channel amorphous Cu 1−x Cr x O 2−δ thin film transistors. Applied Surface Science, 315. 274-278 doi:10.1016/j.apsusc.2014.07.107
In(n.d.) Applied Surface Science Vol. 315. Elsevier BV

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