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Yadav, R.P., Kumar, T., Mittal, A.K., Dwivedi, S., Kanjilal, D. (2015) Fractal characterization of the silicon surfaces produced by ion beam irradiation of varying fluences. Applied Surface Science, 347. 706-712 doi:10.1016/j.apsusc.2015.04.150

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Reference TypeJournal (article/letter/editorial)
TitleFractal characterization of the silicon surfaces produced by ion beam irradiation of varying fluences
JournalApplied Surface Science
AuthorsYadav, R.P.Author
Kumar, T.Author
Mittal, A.K.Author
Dwivedi, S.Author
Kanjilal, D.Author
Year2015 (August)Volume347
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2015.04.150Search in ResearchGate
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Mindat Ref. ID9925612Long-form Identifiermindat:1:5:9925612:0
GUID0
Full ReferenceYadav, R.P., Kumar, T., Mittal, A.K., Dwivedi, S., Kanjilal, D. (2015) Fractal characterization of the silicon surfaces produced by ion beam irradiation of varying fluences. Applied Surface Science, 347. 706-712 doi:10.1016/j.apsusc.2015.04.150
Plain TextYadav, R.P., Kumar, T., Mittal, A.K., Dwivedi, S., Kanjilal, D. (2015) Fractal characterization of the silicon surfaces produced by ion beam irradiation of varying fluences. Applied Surface Science, 347. 706-712 doi:10.1016/j.apsusc.2015.04.150
In(n.d.) Applied Surface Science Vol. 347. Elsevier BV

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