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Iida, Susumu, Ohya, Kaoru, Hirano, Ryoichi, Watanabe, Hidehiro (2016) An analysis of the impact of native oxide, surface contamination and material density on total electron yield in the absence of surface charging effects. Applied Surface Science, 384. 244-250 doi:10.1016/j.apsusc.2016.04.143

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Reference TypeJournal (article/letter/editorial)
TitleAn analysis of the impact of native oxide, surface contamination and material density on total electron yield in the absence of surface charging effects
JournalApplied Surface Science
AuthorsIida, SusumuAuthor
Ohya, KaoruAuthor
Hirano, RyoichiAuthor
Watanabe, HidehiroAuthor
Year2016 (October)Volume384
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2016.04.143Search in ResearchGate
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Mindat Ref. ID9928617Long-form Identifiermindat:1:5:9928617:6
GUID0
Full ReferenceIida, Susumu, Ohya, Kaoru, Hirano, Ryoichi, Watanabe, Hidehiro (2016) An analysis of the impact of native oxide, surface contamination and material density on total electron yield in the absence of surface charging effects. Applied Surface Science, 384. 244-250 doi:10.1016/j.apsusc.2016.04.143
Plain TextIida, Susumu, Ohya, Kaoru, Hirano, Ryoichi, Watanabe, Hidehiro (2016) An analysis of the impact of native oxide, surface contamination and material density on total electron yield in the absence of surface charging effects. Applied Surface Science, 384. 244-250 doi:10.1016/j.apsusc.2016.04.143
In(n.d.) Applied Surface Science Vol. 384. Elsevier BV

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