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Abromavičius, Giedrius, Juodagalvis, Tomas, Buzelis, Rytis, Juškevičius, Kęstutis, Drazdys, Ramutis, Kičas, Simonas (2018) Oxygen plasma etching of fused silica substrates for high power laser optics. Applied Surface Science, 453. 477-481 doi:10.1016/j.apsusc.2018.05.105

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Reference TypeJournal (article/letter/editorial)
TitleOxygen plasma etching of fused silica substrates for high power laser optics
JournalApplied Surface Science
AuthorsAbromavičius, GiedriusAuthor
Juodagalvis, TomasAuthor
Buzelis, RytisAuthor
Juškevičius, KęstutisAuthor
Drazdys, RamutisAuthor
Kičas, SimonasAuthor
Year2018 (September)Volume453
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2018.05.105Search in ResearchGate
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Mindat Ref. ID9934954Long-form Identifiermindat:1:5:9934954:5
GUID0
Full ReferenceAbromavičius, Giedrius, Juodagalvis, Tomas, Buzelis, Rytis, Juškevičius, Kęstutis, Drazdys, Ramutis, Kičas, Simonas (2018) Oxygen plasma etching of fused silica substrates for high power laser optics. Applied Surface Science, 453. 477-481 doi:10.1016/j.apsusc.2018.05.105
Plain TextAbromavičius, Giedrius, Juodagalvis, Tomas, Buzelis, Rytis, Juškevičius, Kęstutis, Drazdys, Ramutis, Kičas, Simonas (2018) Oxygen plasma etching of fused silica substrates for high power laser optics. Applied Surface Science, 453. 477-481 doi:10.1016/j.apsusc.2018.05.105
In(n.d.) Applied Surface Science Vol. 453. Elsevier BV

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Böhme, R., Zimmer, K. (2007) Indirect laser etching of fused silica: Towards high etching rate processing. Applied Surface Science, 253. 8091-8096 doi:10.1016/j.apsusc.2007.02.109
Abromavičius, Giedrius, Skapas, Martynas, Juškėnas, Remigijus (2023) Enhancing Laser Damage Resistance of Co2+:MgAl2O4 Crystal by Plasma Etching. Applied Sciences, 13 (2) 1150 doi:10.3390/app13021150
Grinys, Tomas, Drunga, Tomas, Dobrovolskas, Darius, Dargis, Rytis, Clark, Andrew (2020) Wet etching mechanism of Er2O3 grown on Si by molecular beam epitaxy. Applied Surface Science, 505. 144452pp. doi:10.1016/j.apsusc.2019.144452
Böhme, R., Zimmer, K. (2004) Low roughness laser etching of fused silica using an adsorbed layer. Applied Surface Science, 239. 109-116 doi:10.1016/j.apsusc.2004.05.095
Vass, Cs., Kiss, B., Kopniczky, J., Hopp, B. (2013) Etching of fused silica fiber by metallic laser-induced backside wet etching technique. Applied Surface Science, 278. 241-244 doi:10.1016/j.apsusc.2012.11.163
Juškevičius, K., Audronis, M., Subačius, A., Drazdys, R., Juškėnas, R., Matthews, A., Leyland, A. (2014) High-rate reactive magnetron sputtering of zirconia films for laser optics applications. Applied Physics A, 116. 1229-1240 doi:10.1007/s00339-013-8214-1
Zimmer, K., Böhme, R. (2005) Precise etching of fused silica for micro-optical applications. Applied Surface Science, 243. 415-420 doi:10.1016/j.apsusc.2004.09.118
 
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