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Peng, Hong, Feng, Xingcan, Gong, Jinhui, Wang, Wei, Liu, Hu, Quan, Zhijue, Pan, Shuan, Wang, Li (2018) Low temperature growth of polycrystalline InN films on non-crystalline substrates by plasma-enhanced atomic layer deposition. Applied Surface Science, 459. 830-834 doi:10.1016/j.apsusc.2018.08.093

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Reference TypeJournal (article/letter/editorial)
TitleLow temperature growth of polycrystalline InN films on non-crystalline substrates by plasma-enhanced atomic layer deposition
JournalApplied Surface Science
AuthorsPeng, HongAuthor
Feng, XingcanAuthor
Gong, JinhuiAuthor
Wang, WeiAuthor
Liu, HuAuthor
Quan, ZhijueAuthor
Pan, ShuanAuthor
Wang, LiAuthor
Year2018 (November)Volume459
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2018.08.093Search in ResearchGate
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Mindat Ref. ID9935643Long-form Identifiermindat:1:5:9935643:9
GUID0
Full ReferencePeng, Hong, Feng, Xingcan, Gong, Jinhui, Wang, Wei, Liu, Hu, Quan, Zhijue, Pan, Shuan, Wang, Li (2018) Low temperature growth of polycrystalline InN films on non-crystalline substrates by plasma-enhanced atomic layer deposition. Applied Surface Science, 459. 830-834 doi:10.1016/j.apsusc.2018.08.093
Plain TextPeng, Hong, Feng, Xingcan, Gong, Jinhui, Wang, Wei, Liu, Hu, Quan, Zhijue, Pan, Shuan, Wang, Li (2018) Low temperature growth of polycrystalline InN films on non-crystalline substrates by plasma-enhanced atomic layer deposition. Applied Surface Science, 459. 830-834 doi:10.1016/j.apsusc.2018.08.093
In(n.d.) Applied Surface Science Vol. 459. Elsevier BV

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