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Li, Yang, Sanna, Simone, Norrman, Kion, Christensen, Dennis Valbjørn, Pedersen, Christian Søndergaard, Lastra, Juan Maria García, Traulsen, Marie Lund, Esposito, Vincenzo, Pryds, Nini (2019) Tuning the stoichiometry and electrical properties of tantalum oxide thin films. Applied Surface Science, 470. 1071-1074 doi:10.1016/j.apsusc.2018.11.153

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Reference TypeJournal (article/letter/editorial)
TitleTuning the stoichiometry and electrical properties of tantalum oxide thin films
JournalApplied Surface Science
AuthorsLi, YangAuthor
Sanna, SimoneAuthor
Norrman, KionAuthor
Christensen, Dennis ValbjørnAuthor
Pedersen, Christian SøndergaardAuthor
Lastra, Juan Maria GarcíaAuthor
Traulsen, Marie LundAuthor
Esposito, VincenzoAuthor
Pryds, NiniAuthor
Year2019 (March)Volume470
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2018.11.153Search in ResearchGate
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Mindat Ref. ID9936638Long-form Identifiermindat:1:5:9936638:4
GUID0
Full ReferenceLi, Yang, Sanna, Simone, Norrman, Kion, Christensen, Dennis Valbjørn, Pedersen, Christian Søndergaard, Lastra, Juan Maria García, Traulsen, Marie Lund, Esposito, Vincenzo, Pryds, Nini (2019) Tuning the stoichiometry and electrical properties of tantalum oxide thin films. Applied Surface Science, 470. 1071-1074 doi:10.1016/j.apsusc.2018.11.153
Plain TextLi, Yang, Sanna, Simone, Norrman, Kion, Christensen, Dennis Valbjørn, Pedersen, Christian Søndergaard, Lastra, Juan Maria García, Traulsen, Marie Lund, Esposito, Vincenzo, Pryds, Nini (2019) Tuning the stoichiometry and electrical properties of tantalum oxide thin films. Applied Surface Science, 470. 1071-1074 doi:10.1016/j.apsusc.2018.11.153
In(n.d.) Applied Surface Science Vol. 470. Elsevier BV

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