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Huo, Erguang, Liu, Chao, Xu, Xiaoxiao, Liu, Lang, Wang, Shukun (2019) Dissociation mechanism of HFC-245fa on Cu(1 1 1) surfaces with and without oxygen-covered: A density functional theory study. Applied Surface Science, 480. 487-496 doi:10.1016/j.apsusc.2019.03.016

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Reference TypeJournal (article/letter/editorial)
TitleDissociation mechanism of HFC-245fa on Cu(1 1 1) surfaces with and without oxygen-covered: A density functional theory study
JournalApplied Surface Science
AuthorsHuo, ErguangAuthor
Liu, ChaoAuthor
Xu, XiaoxiaoAuthor
Liu, LangAuthor
Wang, ShukunAuthor
Year2019 (June)Volume480
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2019.03.016Search in ResearchGate
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Mindat Ref. ID9937701Long-form Identifiermindat:1:5:9937701:6
GUID0
Full ReferenceHuo, Erguang, Liu, Chao, Xu, Xiaoxiao, Liu, Lang, Wang, Shukun (2019) Dissociation mechanism of HFC-245fa on Cu(1 1 1) surfaces with and without oxygen-covered: A density functional theory study. Applied Surface Science, 480. 487-496 doi:10.1016/j.apsusc.2019.03.016
Plain TextHuo, Erguang, Liu, Chao, Xu, Xiaoxiao, Liu, Lang, Wang, Shukun (2019) Dissociation mechanism of HFC-245fa on Cu(1 1 1) surfaces with and without oxygen-covered: A density functional theory study. Applied Surface Science, 480. 487-496 doi:10.1016/j.apsusc.2019.03.016
In(n.d.) Applied Surface Science Vol. 480. Elsevier BV

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