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Konh, Mahsa, Lien, Clinton, Zaera, Francisco, Teplyakov, Andrew V. (2019) Application of time-of-flight secondary ion mass spectrometry to the detection of surface intermediates during the first cycle of atomic layer deposition (ALD) of platinum on silica surfaces. Applied Surface Science, 488. 468-476 doi:10.1016/j.apsusc.2019.05.209

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Reference TypeJournal (article/letter/editorial)
TitleApplication of time-of-flight secondary ion mass spectrometry to the detection of surface intermediates during the first cycle of atomic layer deposition (ALD) of platinum on silica surfaces
JournalApplied Surface Science
AuthorsKonh, MahsaAuthor
Lien, ClintonAuthor
Zaera, FranciscoAuthor
Teplyakov, Andrew V.Author
Year2019 (September)Volume488
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2019.05.209Search in ResearchGate
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Mindat Ref. ID9938538Long-form Identifiermindat:1:5:9938538:9
GUID0
Full ReferenceKonh, Mahsa, Lien, Clinton, Zaera, Francisco, Teplyakov, Andrew V. (2019) Application of time-of-flight secondary ion mass spectrometry to the detection of surface intermediates during the first cycle of atomic layer deposition (ALD) of platinum on silica surfaces. Applied Surface Science, 488. 468-476 doi:10.1016/j.apsusc.2019.05.209
Plain TextKonh, Mahsa, Lien, Clinton, Zaera, Francisco, Teplyakov, Andrew V. (2019) Application of time-of-flight secondary ion mass spectrometry to the detection of surface intermediates during the first cycle of atomic layer deposition (ALD) of platinum on silica surfaces. Applied Surface Science, 488. 468-476 doi:10.1016/j.apsusc.2019.05.209
In(n.d.) Applied Surface Science Vol. 488. Elsevier BV

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Lien, Clinton, Konh, Mahsa, Chen, Bo, Teplyakov, Andrew V., Zaera, Francisco (2018) Gas-Phase Electron-Impact Activation of Atomic Layer Deposition (ALD) Precursors: MeCpPtMe3. The Journal of Physical Chemistry Letters, 9 (16). 4602-4606 doi:10.1021/acs.jpclett.8b02125
Chen, Bo, Qin, Xiangdong, Lien, Clinton, Bouman, Menno, Konh, Mahsa, Duan, Yichen, Teplyakov, Andrew V., Zaera, Francisco (2020) Thermal Chemistry of Metal Organic Compounds Adsorbed on Oxide Surfaces. Organometallics, 39 (7) 928-940 doi:10.1021/acs.organomet.9b00636
Lien, Clinton, Sun, Huaxing, Qin, Xiangdong, Zaera, Francisco (2018) Platinum atomic layer deposition on metal substrates: A surface chemistry study. Surface Science, 677. 161-166 doi:10.1016/j.susc.2018.07.002
Konh, Mahsa, Lien, Clinton, Cai, Xuefen, Wei, Su-Huai, Janotti, Anderson, Zaera, Francisco, Teplyakov, Andrew V. (2020) ToF-SIMS Investigation of the Initial Stages of MeCpPt(CH3)3 Adsorption and Decomposition on Nickel Oxide Surfaces: Exploring the Role and Location of the Ligands. Organometallics, 39 (7) 1024-1034 doi:10.1021/acs.organomet.9b00781
Zhao, Jing, Konh, Mahsa, Teplyakov, Andrew (2018) Surface chemistry of thermal dry etching of cobalt thin films using hexafluoroacetylacetone (hfacH). Applied Surface Science, 455. 438-445 doi:10.1016/j.apsusc.2018.05.182
Konh, Mahsa, Wang, Yang, Chen, Hang, Bhatt, Subhash, Xiao, John Q., Teplyakov, Andrew V. (2022) Selectivity in atomically precise etching: Thermal atomic layer etching of a CoFeB alloy and its protection by MgO. Applied Surface Science, 575. 151751pp. doi:10.1016/j.apsusc.2021.151751
Murase, Atsushi, Kato, Yuichi, Sudo, Eiichi (2020) Quantification of organic additives on polymer surfaces by time-of-flight secondary ion mass spectrometry with gold deposition. Applied Surface Science, 509. 144813pp. doi:10.1016/j.apsusc.2019.144813
Mroczka, Robert, Łopucki, Rafał, Żukociński, Grzegorz (2019) Molecular analysis of additives and impurities accumulated on copper electrodeposited layer by time-of-flight secondary ion mass spectrometry. Applied Surface Science, 463. 412-426 doi:10.1016/j.apsusc.2018.08.238
Qin, Xiangdong, Zaera, Francisco (2024) The surface chemistry of the atomic layer deposition of ruthenium on aluminum and tantalum oxide surfaces. Surface Science, 749. doi:10.1016/j.susc.2024.122572
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